Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MDM4 | O15151 | 3/20 | 0.52 |
| ▸ | TP53 | P04637 | 3/20 | 0.52 |
| ▸ | CASP1 | P29466 | 5/20 | 0.49 |
| ▸ | CASP3 | P42574 | 2/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.48 |
| ▸ | TLR2 | O60603 | 2/20 | 0.47 |
| ▸ | MDM2 | Q00987 | 2/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3871700 | 1.00 | MDM4 (0.52) | MDM4TP53CASP1CASP3KMT2A | |
| SCHEMBL30440863 | 1.00 | MDM4 (0.52) | MDM4TP53CASP1CASP3KMT2A | |
| SCHEMBL29989314 | 1.00 | MDM4 (0.52) | MDM4TP53CASP1CASP3KMT2A | |
| SCHEMBL13940186 | 1.00 | MDM4 (0.52) | MDM4TP53CASP1CASP3KMT2A | |
| SCHEMBL29401179 | 1.00 | MDM4 (0.52) | MDM4TP53CASP1CASP3KMT2A | |
| SCHEMBL29824809 | 1.00 | MDM4 (0.52) | MDM4TP53CASP1CASP3KMT2A | |
| SCHEMBL5967446 | 0.91 | MDM4 (0.59) | MDM4TP53CASP3KMT2ATLR2 | |
| SCHEMBL119637 | 0.91 | MDM4 (0.59) | MDM4TP53CASP3KMT2ATLR2 | |
| SCHEMBL29455664 | 0.91 | MDM4 (0.59) | MDM4TP53CASP3KMT2ATLR2 | |
| SCHEMBL119688 | 0.91 | MDM4 (0.59) | MDM4TP53CASP3KMT2ATLR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8895231-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-25 | — | — | US | disclosed |
| US-20120058428-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-08 | — | — | US | disclosed |
| US-20120058428-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-08 | — | — | US | disclosed |