SCHEMBL11855394

SCHEMBL11855394

CSCC(=O)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.51

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ HSD11B1 P28845 3/20 0.51
▸ ALDH1A1 P00352 7/20 0.46
▸ TSHR P16473 2/20 0.46
▸ LMNA P02545 4/20 0.45
▸ HTT P42858 2/20 0.45
▸ MEN1 O00255 1/20 0.45
▸ MAPT P10636 1/20 0.45
▸ STAT6 P42226 1/20 0.45
▸ KMT2A Q03164 1/20 0.45
▸ SMN1; SMN2 Q16637 1/20 0.45
▸ HIF1A Q16665 1/20 0.45
▸ NPSR1 Q6W5P4 1/20 0.45
▸ TP53 P04637 1/20 0.42
▸ HSD17B10 Q99714 1/20 0.42
▸ ITGB1 P05556 1/20 0.41
▸ ITGA4 P13612 1/20 0.41
▸ PTGES O14684 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1770045 0.80 HSD11B1 (0.49) HSD11B1ALDH1A1TSHRLMNAHTT
SCHEMBL1072478 0.76 ALDH1A1 (0.50) HSD11B1ALDH1A1TSHRLMNA
SCHEMBL25568411 0.75 ALDH1A1 (0.52) HSD11B1ALDH1A1TSHRLMNAHTT
SCHEMBL17399690 0.74 HSD11B1 (0.44) HSD11B1ALDH1A1TSHRLMNAHTT
SCHEMBL1075076 0.74 ALDH1A1 (0.49) HSD11B1ALDH1A1TSHRLMNAHTT
SCHEMBL4474354 0.72 ALDH1A1 (0.47) HSD11B1ALDH1A1TSHRLMNAHTT
SCHEMBL14341887 0.72 KDM4E (0.56) HSD11B1ALDH1A1TSHRLMNAHTT
SCHEMBL2526513 0.72 ALDH1A1 (0.47) HSD11B1ALDH1A1TSHRLMNAHTT
SCHEMBL8533984 0.72 ALDH1A1 (0.50) HSD11B1ALDH1A1TSHRLMNAHTT
SCHEMBL3323219 0.72 HSD11B1 (0.52) HSD11B1ALDH1A1LMNAHTTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7273690-B2 Positive resist composition for immersion exposure and method of pattern formation with the same FUJIFILM CORPORATION (JP) 2007-09-25 — — US disclosed
US-20070218405-A1 Positive resist composition and pattern formation method using the positive resist composition FUJIFILM CORPORATION (JP) 2007-09-20 — — US disclosed
US-20070105045-A1 Positive resist composition and pattern formation method using the positive resist composition FUJIFILM CORPORATION 2007-05-10 — — US disclosed
US-20070042290-A1 resin containing acrylic ester monomers capable of increasing solubility in alkali developer by action of acid, acid generator, aryldicycloalkylsulfonium compounds, and nonionic surfactant; semiconductors, integrated circuits FUJI PHOTO FILM CO., LTD. 2007-02-22 — — US disclosed
US-3932471-A CARBAMYLOXIMES, INSECTICIDES, MITICIDES, NEMATOCIDES DIAMOND SHAMROCK CORPORATION (US) 1976-01-13 — — US disclosed
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