SCHEMBL11904024

SCHEMBL11904024

[CH2]CCC1CC(C)CC(C)C1

nearest known ligand 0.34

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16191189 0.82 EPHX2 (0.40) EPHX2
SCHEMBL4743419 0.79
SCHEMBL304777 0.77 EPHX2 (0.37) EPHX2
SCHEMBL2677589 0.75
SCHEMBL15047680 0.74
SCHEMBL11903871 0.74 EPHX2 (0.36) EPHX2
SCHEMBL910589 0.73
SCHEMBL5678755 0.72
SCHEMBL10425199 0.72 ALDH1A1 (0.37)
SCHEMBL910738 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2487148-B1 CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN MITSUBISHI GAS CHEMICAL CO (JP) 2014-12-31 EP disclosed
EP-2487148-A1 CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-08-15 EP disclosed