SCHEMBL11907682

SCHEMBL11907682

CCOC(OC(=O)C1CC2C=CC1C2)C(=O)OC(C)C

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 10/20 0.46
HPGD P15428 1/20 0.38
LMNA P02545 2/20 0.38
KDM4E B2RXH2 2/20 0.38
POLB P06746 3/20 0.38
KMT2A Q03164 3/20 0.38
RAB9A P51151 1/20 0.37
HSD17B10 Q99714 2/20 0.36
APEX1 P27695 1/20 0.36
RECQL P46063 1/20 0.36
BLM P54132 1/20 0.36
ESR2 Q92731 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
MAPK1 P28482 2/20 0.35
MAPT P10636 1/20 0.33
MEN1 O00255 1/20 0.31
ALOX15 P16050 1/20 0.31
TSHR P16473 1/20 0.31
HTT P42858 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL32688966 0.85 ALDH1A1 (0.56) ALDH1A1HPGDLMNAKDM4EPOLB
SCHEMBL3368345 0.83 ALDH1A1 (0.49) ALDH1A1HPGDLMNAKDM4EPOLB
SCHEMBL952719 0.83 ALDH1A1 (0.56) ALDH1A1HPGDLMNAKDM4EPOLB
SCHEMBL32688795 0.82 ALDH1A1 (0.54) ALDH1A1HPGDLMNAKDM4EPOLB
SCHEMBL11909307 0.82 ALDH1A1 (0.46) ALDH1A1HPGDLMNAKDM4EPOLB
SCHEMBL951662 0.77 ALDH1A1 (0.51) ALDH1A1HPGDLMNAKDM4EPOLB
SCHEMBL22263939 0.77 ALDH1A1 (0.44) ALDH1A1HPGDLMNAKDM4EPOLB
SCHEMBL11909207 0.77 ALDH1A1 (0.50) ALDH1A1HPGDLMNAKDM4EPOLB
SCHEMBL200507 0.77 ALDH1A1 (0.49) ALDH1A1HPGDLMNAKDM4EPOLB
SCHEMBL2754655 0.77 ALDH1A1 (0.49) ALDH1A1HPGDLMNAKDM4EPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11886119-B2 Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2024-01-30 US disclosed
US-20230185195-A1 MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2023-06-15 US disclosed
US-11599025-B2 Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2023-03-07 US disclosed
CN-111183395-A Resin material for forming underlayer film, resist underlayer film, method for producing resist underlayer film, and laminate 三井化学株式会社 2020-05-19 CN disclosed
US-8450440-B2 Method for purifying polymer and polymer MITSUI CHEMICALS, INC. (JP) 2013-05-28 US disclosed
US-20120208976-A1 METHOD FOR PURIFYING POLYMER AND POLYMER MITSUI CHEMICALS, INC (JP) 2012-08-16 US disclosed