SCHEMBL11909307

SCHEMBL11909307

CCOC(OC(=O)C1CC2C=CC1C2)OC(C)C

nearest known ligand 0.46

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.46
KDM4E B2RXH2 1/20 0.38
LMNA P02545 1/20 0.38
HPGD P15428 1/20 0.36
POLB P06746 3/20 0.35
KMT2A Q03164 2/20 0.35
RAB9A P51151 1/20 0.35
APEX1 P27695 1/20 0.34
RECQL P46063 1/20 0.34
BLM P54132 1/20 0.34
ESR2 Q92731 1/20 0.34
HSD17B10 Q99714 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
MAPK1 P28482 1/20 0.33
THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3368345 0.83 ALDH1A1 (0.49) ALDH1A1KDM4ELMNAHPGDPOLB
SCHEMBL11907682 0.82 ALDH1A1 (0.46) ALDH1A1KDM4ELMNAHPGDPOLB
SCHEMBL22263633 0.80 ALDH1A1 (0.51) ALDH1A1KDM4ELMNAHPGDPOLB
SCHEMBL952719 0.80 ALDH1A1 (0.56) ALDH1A1KDM4ELMNAHPGDPOLB
SCHEMBL22263939 0.80 ALDH1A1 (0.44) ALDH1A1KDM4ELMNAHPGDPOLB
SCHEMBL951662 0.77 ALDH1A1 (0.51) ALDH1A1KDM4ELMNAHPGDPOLB
SCHEMBL32688795 0.77 ALDH1A1 (0.54) ALDH1A1KDM4ELMNAHPGDPOLB
SCHEMBL11800180 0.77 ALDH1A1 (0.56) ALDH1A1KDM4ELMNAHPGDPOLB
SCHEMBL6861633 0.76 ALDH1A1 (0.52) ALDH1A1KDM4ELMNAHPGDPOLB
SCHEMBL22263813 0.76 ALDH1A1 (0.47) ALDH1A1KDM4ELMNAHPGDPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11886119-B2 Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2024-01-30 US disclosed
US-20230185195-A1 MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2023-06-15 US disclosed
US-11599025-B2 Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2023-03-07 US disclosed
US-8450440-B2 Method for purifying polymer and polymer MITSUI CHEMICALS, INC. (JP) 2013-05-28 US disclosed
US-20120208976-A1 METHOD FOR PURIFYING POLYMER AND POLYMER MITSUI CHEMICALS, INC (JP) 2012-08-16 US disclosed