Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | ADH1B | P00325 | 2/20 | 0.31 |
| ▸ | ADH1C | P00326 | 2/20 | 0.31 |
| ▸ | ADH1A | P07327 | 2/20 | 0.31 |
| ▸ | ADH4 | P08319 | 2/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | ADH7 | P40394 | 1/20 | 0.31 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL72977 | 1.00 | NPC1 (0.38) | NPC1CA1CA2ADH1BADH1C | |
| SCHEMBL9035182 | 1.00 | NPC1 (0.38) | NPC1CA1CA2ADH1BADH1C | |
| SCHEMBL6987461 | 0.98 | NPC1 (0.34) | NPC1 | |
| SCHEMBL9036075 | 0.88 | — | — | |
| SCHEMBL4952178 | 0.82 | NPC1 (0.34) | NPC1HPGD | |
| SCHEMBL73235 | 0.80 | NPC1 (0.45) | NPC1CA1CA2ADH1BADH1C | |
| SCHEMBL8802672 | 0.80 | NPC1 (0.45) | NPC1CA1CA2ADH1BADH1C | |
| SCHEMBL25700953 | 0.78 | SLC6A2 (0.33) | — | |
| SCHEMBL112607 | 0.78 | — | — | |
| SCHEMBL9517342 | 0.77 | NPC1 (0.48) | NPC1CA1CA2HPGDEPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11886119-B2 | Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2024-01-30 | — | — | US | disclosed |
| CN-110709774-B | Underlayer film forming material, resist underlayer film, method for producing resist underlayer film, and laminate | 三井化学株式会社 | 2023-12-08 | — | — | CN | disclosed |
| US-20230185195-A1 | MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2023-06-15 | — | — | US | disclosed |
| US-11599025-B2 | Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2023-03-07 | — | — | US | disclosed |
| US-20200264511-A1 | MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2020-08-20 | — | — | US | disclosed |
| EP-3693793-A1 | RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR PRODUCING RESIST UNDERLAYER FILM, AND LAYERED PRODUCT | Mitsui Chemicals, Inc. (JP) | 2020-08-12 | — | — | EP | disclosed |
| US-20200241419-A1 | RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2020-07-30 | — | — | US | disclosed |
| CN-111183395-A | Resin material for forming underlayer film, resist underlayer film, method for producing resist underlayer film, and laminate | 三井化学株式会社 | 2020-05-19 | — | — | CN | disclosed |
| CN-110709774-A | Material for forming underlayer film, resist underlayer film, method for producing resist underlayer film, and laminate | 三井化学株式会社 | 2020-01-17 | — | — | CN | disclosed |
| US-8450440-B2 | Method for purifying polymer and polymer | MITSUI CHEMICALS, INC. (JP) | 2013-05-28 | — | — | US | disclosed |
| US-20120208976-A1 | METHOD FOR PURIFYING POLYMER AND POLYMER | MITSUI CHEMICALS, INC (JP) | 2012-08-16 | — | — | US | disclosed |