SCHEMBL11921103

SCHEMBL11921103

CCn1c2ccccc2c2cc([S+](CCOC)CCOC)ccc21

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 7/20 0.51
▸ MAPT P10636 6/20 0.51
▸ ALDH1A1 P00352 5/20 0.51
▸ MEN1 O00255 4/20 0.51
▸ KMT2A Q03164 4/20 0.51
▸ HPGD P15428 4/20 0.51
▸ HTT P42858 3/20 0.51
▸ MAPK1 P28482 2/20 0.51
▸ HBB P68871 1/20 0.51
▸ HSD17B10 Q99714 1/20 0.51
▸ TDP1 Q9NUW8 1/20 0.51
▸ SRC P12931 2/20 0.49
▸ PTGER4 P35408 5/20 0.48
▸ LMNA P02545 6/20 0.46
▸ POLB P06746 3/20 0.45
▸ PKM P14618 1/20 0.45
▸ SMN1; SMN2 Q16637 3/20 0.45
▸ HCRTR1 O43613 2/20 0.45
▸ RAB9A P51151 2/20 0.45
▸ PAX8 Q06710 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11921071 0.83 MAPT (0.54) KDM4EMAPTALDH1A1MEN1KMT2A
SCHEMBL11921074 0.76 MAPT (0.58) KDM4EMAPTALDH1A1MEN1KMT2A
SCHEMBL29403453 0.76 MAPT (0.58) KDM4EMAPTALDH1A1MEN1KMT2A
SCHEMBL24359387 0.72 KDM4E (0.54) KDM4EMAPTALDH1A1MEN1KMT2A
SCHEMBL29643325 0.72 MAPT (0.68) KDM4EMAPTALDH1A1MEN1KMT2A
SCHEMBL15466317 0.72 MAPT (0.68) KDM4EMAPTALDH1A1MEN1KMT2A
SCHEMBL13979310 0.72 KDM4E (0.70) KDM4EMAPTALDH1A1MEN1KMT2A
SCHEMBL29360167 0.72 ALDH1A1 (0.75) KDM4EMAPTALDH1A1MEN1KMT2A
SCHEMBL29963695 0.72 ALDH1A1 (0.75) KDM4EMAPTALDH1A1MEN1KMT2A
SCHEMBL151563 0.72 ALDH1A1 (0.75) KDM4EMAPTALDH1A1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120207978-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION FUJIFILM CORPORATION (JP) 2012-08-16 — — US disclosed
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