SCHEMBL11921071

SCHEMBL11921071

CCCC[S+](CCCC)c1ccc2c(c1)c1ccccc1n2CC

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 9/20 0.54
▸ KDM4E B2RXH2 7/20 0.54
▸ MEN1 O00255 3/20 0.54
▸ KMT2A Q03164 3/20 0.54
▸ ALDH1A1 P00352 3/20 0.54
▸ HTT P42858 2/20 0.54
▸ MAPK1 P28482 2/20 0.54
▸ HPGD P15428 2/20 0.54
▸ HSD17B10 Q99714 2/20 0.54
▸ HBB P68871 1/20 0.54
▸ TDP1 Q9NUW8 1/20 0.54
▸ LMNA P02545 6/20 0.48
▸ SMN1; SMN2 Q16637 2/20 0.47
▸ POLB P06746 2/20 0.47
▸ PKM P14618 1/20 0.47
▸ NPSR1 Q6W5P4 1/20 0.46
▸ DRD3 P35462 1/20 0.45
▸ SRC P12931 2/20 0.45
▸ TP53 P04637 2/20 0.43
▸ NPY5R Q15761 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11921089 0.85 PSEN1 (0.41) MAPTKDM4EMEN1KMT2AALDH1A1
SCHEMBL11921085 0.85 ALDH1A1 (0.39) MAPTKDM4EMEN1KMT2AALDH1A1
SCHEMBL11921103 0.83 KDM4E (0.51) MAPTKDM4EMEN1KMT2AALDH1A1
SCHEMBL11921097 0.78 LMNA (0.40) MAPTKDM4EMEN1KMT2AALDH1A1
SCHEMBL29403453 0.78 MAPT (0.58) MAPTKDM4EMEN1KMT2AALDH1A1
SCHEMBL11921074 0.78 MAPT (0.58) MAPTKDM4EMEN1KMT2AALDH1A1
SCHEMBL13979310 0.74 KDM4E (0.70) MAPTKDM4EMEN1KMT2AALDH1A1
SCHEMBL29963695 0.74 ALDH1A1 (0.75) MAPTKDM4EMEN1KMT2AALDH1A1
SCHEMBL151563 0.74 ALDH1A1 (0.75) MAPTKDM4EMEN1KMT2AALDH1A1
SCHEMBL29360167 0.74 ALDH1A1 (0.75) MAPTKDM4EMEN1KMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9316911-B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2016-04-19 — — US disclosed
US-8846293-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition FUJIFILM CORPORATION (JP) 2014-09-30 — — US disclosed
US-20130004741-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-03 — — US disclosed
US-20120251948-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION FUJIFILM CORPORATION (JP) 2012-10-04 — — US disclosed
US-20120207978-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION FUJIFILM CORPORATION (JP) 2012-08-16 — — US disclosed
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