Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CASP3 | P42574 | 4/20 | 0.54 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.53 |
| ▸ | MDM4 | O15151 | 3/20 | 0.51 |
| ▸ | TP53 | P04637 | 3/20 | 0.51 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.48 |
| ▸ | MDM2 | Q00987 | 2/20 | 0.46 |
| ▸ | FABP7 | O15540 | 1/20 | 0.44 |
| ▸ | FABP5 | Q01469 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL119042 | 1.00 | CASP3 (0.54) | CASP3KMT2AMDM4TP53EPHX2 | |
| SCHEMBL2623566 | 0.89 | CASP3 (0.53) | CASP3KMT2AMDM4TP53EPHX2 | |
| SCHEMBL119534 | 0.85 | CASP3 (0.60) | CASP3KMT2AMDM4TP53EPHX2 | |
| SCHEMBL119338 | 0.85 | CASP3 (0.60) | CASP3KMT2AMDM4TP53EPHX2 | |
| SCHEMBL7604717 | 0.85 | CASP3 (0.54) | CASP3KMT2AMDM4TP53EPHX2 | |
| SCHEMBL21416122 | 0.84 | CASP3 (0.54) | CASP3KMT2AMDM4TP53EPHX2 | |
| SCHEMBL29402082 | 0.84 | CASP3 (0.54) | CASP3KMT2AMDM4TP53EPHX2 | |
| SCHEMBL21403417 | 0.84 | CASP3 (0.54) | CASP3KMT2AMDM4TP53EPHX2 | |
| SCHEMBL21403415 | 0.84 | CASP3 (0.54) | CASP3KMT2AMDM4TP53EPHX2 | |
| SCHEMBL13227980 | 0.84 | CASP3 (0.51) | CASP3KMT2AMDM4TP53EPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8895231-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-25 | — | — | US | disclosed |
| US-8895231-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-25 | — | — | US | disclosed |
| US-20120058428-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-08 | — | — | US | disclosed |
| US-20120058428-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-08 | — | — | US | disclosed |