Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 1/20 | 0.35 |
| ▸ | CES1 | P23141 | 1/20 | 0.35 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.31 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.31 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11928281 | 0.86 | CES2 (0.33) | CES2CES1 | |
| SCHEMBL6574709 | 0.77 | CES2 (0.41) | CES2CES1HDAC8HDAC6EPHX1 | |
| SCHEMBL1651118 | 0.76 | CES2 (0.39) | CES2CES1HDAC8HDAC6EPHX1 | |
| SCHEMBL990465 | 0.73 | CES2 (0.36) | CES2CES1HDAC8HDAC6EPHX1 | |
| SCHEMBL800571 | 0.73 | CES2 (0.36) | CES2CES1HDAC8HDAC6EPHX1 | |
| SCHEMBL5463371 | 0.72 | EPHX1 (0.37) | CES2CES1HDAC8HDAC6EPHX1 | |
| SCHEMBL692341 | 0.70 | NAAA (0.42) | — | |
| SCHEMBL6474121 | 0.70 | CES2 (0.46) | CES2CES1HDAC8HDAC6EPHX1 | |
| SCHEMBL5698396 | 0.70 | CES2 (0.46) | CES2CES1HDAC8HDAC6EPHX1 | |
| SCHEMBL2467390 | 0.70 | CES2 (0.46) | CES2CES1HDAC8HDAC6EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1708027-B1 | UPPER LAYER FILM FORMING COMPOSITION FOR LIQUID IMMERSION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORP (JP) | 2019-03-13 | — | — | EP | disclosed |
| US-8247165-B2 | Upper layer film forming composition for liquid immersion and method of forming photoresist pattern | JSR CORPORATION (JP) | 2012-08-21 | — | — | US | disclosed |