Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TLR2 | O60603 | 2/20 | 0.55 |
| ▸ | TGM2 | P21980 | 1/20 | 0.48 |
| ▸ | MDM4 | O15151 | 1/20 | 0.47 |
| ▸ | TP53 | P04637 | 1/20 | 0.47 |
| ▸ | SLC17A5 | Q9NRA2 | 1/20 | 0.46 |
| ▸ | FOLH1 | Q04609 | 1/20 | 0.45 |
| ▸ | MDM2 | Q00987 | 5/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.43 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31370449 | 0.87 | TLR2 (0.60) | TLR2MDM4TP53MDM2KMT2A | |
| SCHEMBL119437 | 0.87 | TLR2 (0.60) | TLR2MDM4TP53MDM2KMT2A | |
| SCHEMBL2244041 | 0.87 | PTPN1 (0.49) | TLR2FOLH1KMT2ACHRNB2CHRNA4 | |
| SCHEMBL29397967 | 0.85 | MDM4 (0.53) | TGM2MDM4TP53SLC17A5MDM2 | |
| SCHEMBL3725027 | 0.85 | MDM4 (0.53) | TGM2MDM4TP53SLC17A5MDM2 | |
| SCHEMBL29401862 | 0.85 | MDM4 (0.53) | TGM2MDM4TP53SLC17A5MDM2 | |
| SCHEMBL800112 | 0.85 | MDM4 (0.53) | TGM2MDM4TP53SLC17A5MDM2 | |
| SCHEMBL3725031 | 0.85 | MDM4 (0.53) | TGM2MDM4TP53SLC17A5MDM2 | |
| SCHEMBL29547912 | 0.85 | MDM4 (0.53) | TGM2MDM4TP53SLC17A5MDM2 | |
| SCHEMBL120504 | 0.85 | TLR2 (0.55) | TLR2TGM2MDM4TP53SLC17A5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8895231-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-25 | — | — | US | disclosed |
| US-8895231-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-25 | — | — | US | disclosed |
| US-20120058428-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-08 | — | — | US | disclosed |
| US-20120058428-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-08 | — | — | US | disclosed |