Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 4/20 | 0.46 |
| ▸ | ESR1 | P03372 | 5/20 | 0.38 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | KDM1A | O60341 | 1/20 | 0.36 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.36 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.34 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.34 |
| ▸ | NPC1 | O15118 | 2/20 | 0.34 |
| ▸ | RAB9A | P51151 | 2/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | PGR | P06401 | 1/20 | 0.33 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.33 |
| ▸ | AR | P10275 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14427949 | 1.00 | ELANE (0.46) | ELANEESR1ESR2ALDH1A1TSHR | |
| SCHEMBL18327369 | 0.90 | ELANE (0.46) | ELANEESR1ALDH1A1TSHRKDM1A | |
| SCHEMBL14067018 | 0.90 | ELANE (0.53) | ELANEESR1ESR2ALDH1A1TSHR | |
| SCHEMBL14067025 | 0.89 | ELANE (0.45) | ELANEESR1KDM1AFFAR1L3MBTL1 | |
| SCHEMBL26374270 | 0.89 | ELANE (0.37) | ELANEESR1ESR2ALDH1A1TSHR | |
| SCHEMBL13922735 | 0.88 | ELANE (0.44) | ELANEESR1ALDH1A1TSHRKDM1A | |
| SCHEMBL14067001 | 0.86 | ELANE (0.40) | ELANEALDH1A1TSHRKDM1A | |
| SCHEMBL22183767 | 0.84 | ELANE (0.42) | ELANEESR1ESR2KDM1A | |
| SCHEMBL2736401 | 0.83 | ALDH1A1 (0.47) | ESR1ESR2ALDH1A1TSHRFFAR1 | |
| SCHEMBL111624 | 0.83 | ELANE (0.57) | ELANEESR1ALDH1A1TSHRKDM1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9217919-B2 | Photosensitive composition, pattern-forming method using the composition, and resin used in the composition | FUJIFILM CORPORATION (JP) | 2015-12-22 | — | — | US | disclosed |
| US-8895226-B2 | Coating composition for DUV filtering, method of forming photoresist pattern using the same and method of fabricating semiconductor device by using the method | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2014-11-25 | — | — | US | disclosed |
| US-8895226-B2 | Coating composition for DUV filtering, method of forming photoresist pattern using the same and method of fabricating semiconductor device by using the method | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2014-11-25 | — | — | US | disclosed |
| US-20140205950-A1 | COATING COMPOSITION FOR DUV FILTERING, METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE BY USING THE METHOD | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2014-07-24 | — | — | US | disclosed |
| US-20140205950-A1 | COATING COMPOSITION FOR DUV FILTERING, METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE BY USING THE METHOD | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2014-07-24 | — | — | US | disclosed |
| US-8304177-B2 | Process for producing ink jet head | CANON KABUSHIKI KAISHA (JP) | 2012-11-06 | — | — | US | disclosed |
| US-20120058433-A1 | PROCESS FOR PRODUCING INK JET HEAD | CANON KABUSHIKI KAISHA (JP) | 2012-03-08 | — | — | US | disclosed |
| US-20120021355-A1 | COATING COMPOSITION FOR DUV FILTERING, METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE BY USING THE METHOD | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-01-26 | — | — | US | disclosed |
| US-20110159433-A1 | PHOTOSENSITIVE COMPOSITION, PATTERN-FORMING METHOD USING THE COMPOSITION, AND RESIN USED IN THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-06-30 | — | — | US | disclosed |
| US-7465529-B2 | Radiation sensitive material and method for forming pattern | FUJITSU LIMITED (JP) | 2008-12-16 | — | — | US | disclosed |
| US-7179580-B2 | Radiation sensitive material and method for forming pattern | FUJITSU LIMITED (JP) | 2007-02-20 | — | — | US | disclosed |
| US-20070037090-A1 | Copolymer of di-tert-butyl, di-tetrahydropyranyl or di-oxocyclohexyl itaconate and adamantyl, norbornanyl, perhydroanthracenyl or perhydrodimethanonaphthyl (meth)acrylate and a photo-acid initiator; good transparency and etching resistance, high sensitivity, and little peeling. | FUJITSU LIMITED | 2007-02-15 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110159433-A1 | PHOTOSENSITIVE COMPOSITION, PATTERN-FORMING METHOD USING THE COMPOSITION, AND RESIN USED IN THE COMPOSITION | SUN2, LCP1, PHYKPL | ELANE 1810/4885ESR1 1396/4885ESR2 1722/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.