SCHEMBL11964041

SCHEMBL11964041

O=C(NCCCCNC(=O)OC(C(=O)c1ccccc1)c1ccccc1)OC(C(=O)c1ccccc1)c1ccccc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.58
CYP3A4 P08684 3/20 0.58
MEN1 O00255 4/20 0.49
KMT2A Q03164 4/20 0.49
MAPT P10636 2/20 0.49
NPC1 O15118 2/20 0.49
RAB9A P51151 2/20 0.49
POLB P06746 1/20 0.49
SMN1; SMN2 Q16637 2/20 0.48
TDP1 Q9NUW8 2/20 0.45
ADRB2 P07550 1/20 0.44
LMNA P02545 3/20 0.44
L3MBTL1 Q9Y468 1/20 0.43
NPSR1 Q6W5P4 2/20 0.43
EPHX2 P34913 1/20 0.43
CYP2C19 P33261 2/20 0.42
CYP1A2 P05177 1/20 0.42
CYP2C9 P11712 1/20 0.42
CES2 O00748 1/20 0.42
CES1 P23141 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14962131 0.93 ALDH1A1 (0.55) ALDH1A1CYP3A4MEN1KMT2AMAPT
SCHEMBL12726409 0.93 ALDH1A1 (0.51) ALDH1A1CYP3A4MEN1KMT2AMAPT
SCHEMBL20895713 0.92 NAAA (0.56) ALDH1A1CYP3A4MAPTNPC1RAB9A
SCHEMBL749000 0.92 ALDH1A1 (0.56) ALDH1A1CYP3A4MEN1KMT2AMAPT
SCHEMBL20895767 0.88 ALDH1A1 (0.59) ALDH1A1CYP3A4MEN1KMT2AMAPT
SCHEMBL20895760 0.85 ALDH1A1 (0.62) ALDH1A1CYP3A4MEN1KMT2AMAPT
SCHEMBL14962132 0.80 NAAA (0.46) ALDH1A1CYP3A4NPC1RAB9ASMN1; SMN2
SCHEMBL27752446 0.80 ALDH1A1 (0.63) ALDH1A1CYP3A4MEN1KMT2AMAPT
SCHEMBL8348384 0.78 ALDH1A1 (0.61) ALDH1A1CYP3A4MEN1KMT2AMAPT
SCHEMBL28219066 0.77 ALDH1A1 (0.73) ALDH1A1CYP3A4MEN1KMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8507175-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-13 US disclosed
US-8507175-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-13 US disclosed
US-20120202158-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-09 US disclosed
US-20120202158-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-09 US disclosed
US-20110091812-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-04-21 US disclosed