Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MDM4 | O15151 | 3/20 | 0.53 |
| ▸ | TP53 | P04637 | 3/20 | 0.53 |
| ▸ | MDM2 | Q00987 | 6/20 | 0.47 |
| ▸ | SLC17A5 | Q9NRA2 | 1/20 | 0.46 |
| ▸ | CASP3 | P42574 | 2/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL120776 | 1.00 | MDM4 (0.53) | MDM4TP53MDM2SLC17A5CASP3 | |
| SCHEMBL22804086 | 0.95 | MEN1 (0.49) | MDM4TP53MDM2SLC17A5 | |
| SCHEMBL22804111 | 0.95 | MEN1 (0.49) | MDM4TP53MDM2SLC17A5 | |
| SCHEMBL15521164 | 0.94 | MDM4 (0.53) | MDM4TP53MDM2SLC17A5CASP3 | |
| SCHEMBL1000833 | 0.92 | ADAM17 (0.51) | MDM4TP53MDM2SLC17A5 | |
| SCHEMBL1709188 | 0.92 | ADAM17 (0.51) | MDM4TP53MDM2SLC17A5 | |
| SCHEMBL5969202 | 0.92 | ADAM17 (0.51) | MDM4TP53MDM2SLC17A5 | |
| SCHEMBL29364320 | 0.92 | ADAM17 (0.51) | MDM4TP53MDM2SLC17A5 | |
| SCHEMBL30917941 | 0.92 | ADAM17 (0.51) | MDM4TP53MDM2SLC17A5 | |
| SCHEMBL29353403 | 0.92 | ADAM17 (0.51) | MDM4TP53MDM2SLC17A5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2020252713-A1 | MODIFIED HYDROPHOBIC AUXILIARY MATERIAL, PREPARATION METHOD THEREFOR AND USE THEREOF | 浙江智达药业有限公司 | 2020-12-24 | — | — | WO | disclosed |
| US-8895231-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-25 | — | — | US | disclosed |
| US-8895231-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-25 | — | — | US | disclosed |
| US-20120058428-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-08 | — | — | US | disclosed |
| US-20120058428-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-08 | — | — | US | disclosed |