Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MDM4 | O15151 | 3/20 | 0.49 |
| ▸ | TP53 | P04637 | 3/20 | 0.49 |
| ▸ | MDM2 | Q00987 | 6/20 | 0.45 |
| ▸ | TNF | P01375 | 1/20 | 0.43 |
| ▸ | SLC17A5 | Q9NRA2 | 1/20 | 0.42 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.42 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.42 |
| ▸ | CASP3 | P42574 | 2/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30196497 | 1.00 | MDM4 (0.49) | MDM4TP53MDM2TNFSLC17A5 | |
| SCHEMBL5717685 | 1.00 | MDM4 (0.49) | MDM4TP53MDM2TNFSLC17A5 | |
| SCHEMBL30057560 | 0.93 | MDM2 (0.51) | MDM4TP53MDM2TNFSLC17A5 | |
| SCHEMBL30057098 | 0.93 | MDM2 (0.51) | MDM4TP53MDM2TNFSLC17A5 | |
| SCHEMBL13470493 | 0.88 | MDM4 (0.50) | MDM4TP53MDM2TNFCASP3 | |
| SCHEMBL13470198 | 0.86 | MDM4 (0.52) | MDM4TP53MDM2CASP3 | |
| SCHEMBL15729186 | 0.82 | MDM4 (0.54) | MDM4TP53MDM2CASP3 | |
| SCHEMBL18795312 | 0.82 | MDM4 (0.54) | MDM4TP53MDM2CASP3 | |
| SCHEMBL29615250 | 0.82 | MDM4 (0.54) | MDM4TP53MDM2CASP3 | |
| SCHEMBL119483 | 0.81 | MDM4 (0.52) | MDM4TP53MDM2SLC17A5CASP3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8895231-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-25 | — | — | US | disclosed |
| US-8895231-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-25 | — | — | US | disclosed |
| US-20120058428-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-08 | — | — | US | disclosed |
| US-20120058428-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-08 | — | — | US | disclosed |