Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.44 |
| ▸ | PPARG | P37231 | 5/20 | 0.40 |
| ▸ | PPARA | Q07869 | 5/20 | 0.40 |
| ▸ | LTB4R | Q15722 | 1/20 | 0.40 |
| ▸ | LTB4R2 | Q9NPC1 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.38 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.38 |
| ▸ | AOC3 | Q16853 | 1/20 | 0.37 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14118472 | 0.89 | SLC7A5 (0.42) | SLC7A5PPARGPPARALTB4RLTB4R2 | |
| SCHEMBL11999022 | 0.86 | SLC6A4 (0.39) | PPARGPPARAALDH1A1SLC6A4CYP1A2 | |
| SCHEMBL2758479 | 0.86 | SLC7A5 (0.39) | SLC7A5PPARGPPARALTB4RLTB4R2 | |
| SCHEMBL16247801 | 0.85 | SLC7A5 (0.38) | SLC7A5PPARGPPARALTB4RLTB4R2 | |
| SCHEMBL15503595 | 0.85 | SLC7A5 (0.41) | SLC7A5PPARGPPARAALDH1A1TSHR | |
| SCHEMBL15503586 | 0.84 | SLC7A5 (0.41) | SLC7A5PPARGPPARALTB4RLTB4R2 | |
| SCHEMBL18473529 | 0.83 | SLC7A5 (0.41) | SLC7A5PPARGPPARALTB4RLTB4R2 | |
| SCHEMBL11998999 | 0.82 | ALDH1A1 (0.39) | SLC7A5LTB4RLTB4R2ALDH1A1TSHR | |
| SCHEMBL10627978 | 0.81 | ALDH1A1 (0.47) | PPARGPPARAALDH1A1SLC6A4CYP1A2 | |
| SCHEMBL11999013 | 0.80 | SLC7A5 (0.44) | SLC7A5PPARGPPARALTB4RLTB4R2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120214091-A1 | RESIST FILM, RESIST COATED MASK BLANKS AND METHOD OF FORMING RESIST PATTERN USING THE RESIST FILM, AND CHEMICAL AMPLIFICATION TYPE RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-08-23 | — | — | US | disclosed |