SCHEMBL11999013

SCHEMBL11999013

CCC(C)c1ccc(OC(C)c2c3ccccc3cc3ccccc23)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC7A5 Q01650 1/20 0.44
LTB4R Q15722 1/20 0.40
LTB4R2 Q9NPC1 1/20 0.40
ALDH1A1 P00352 3/20 0.39
TSHR P16473 1/20 0.39
GAA P10253 2/20 0.36
MAPT P10636 2/20 0.36
PPARG P37231 1/20 0.35
PPARA Q07869 1/20 0.35
ALOX5 P09917 1/20 0.35
MEN1 O00255 4/20 0.34
KMT2A Q03164 4/20 0.34
TDP1 Q9NUW8 2/20 0.34
SMN1; SMN2 Q16637 2/20 0.34
KDM4E B2RXH2 1/20 0.34
GLA P06280 1/20 0.34
TP53 P04637 1/20 0.34
PKM P14618 1/20 0.33
MAPK1 P28482 1/20 0.33
HTT P42858 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2758486 0.86 SLC7A5 (0.39) SLC7A5LTB4RLTB4R2ALDH1A1TSHR
SCHEMBL15503593 0.85 SLC7A5 (0.41) SLC7A5LTB4RLTB4R2ALDH1A1TSHR
SCHEMBL15503594 0.84 SLC7A5 (0.41) SLC7A5LTB4RLTB4R2ALDH1A1TSHR
SCHEMBL14118472 0.83 SLC7A5 (0.42) SLC7A5LTB4RLTB4R2ALDH1A1TSHR
SCHEMBL11998991 0.81 SLC7A5 (0.47) SLC7A5LTB4RLTB4R2ALDH1A1TSHR
SCHEMBL11998985 0.80 SLC7A5 (0.44) SLC7A5LTB4RLTB4R2ALDH1A1TSHR
SCHEMBL10182886 0.79 SLC7A5 (0.41) SLC7A5LTB4RLTB4R2ALDH1A1TSHR
SCHEMBL15503592 0.78 SLC7A5 (0.39) SLC7A5LTB4RLTB4R2ALDH1A1TSHR
SCHEMBL15503600 0.77 SLC7A5 (0.36) SLC7A5ALDH1A1TSHRGAAPPARG
SCHEMBL14118645 0.77 ALDH1A1 (0.46) SLC7A5ALDH1A1TSHRMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8735048-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method FUJIFILM CORPORATION (JP) 2014-05-27 US disclosed
US-20120301817-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE COMPOSITION AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2012-11-29 US disclosed
US-20120214091-A1 RESIST FILM, RESIST COATED MASK BLANKS AND METHOD OF FORMING RESIST PATTERN USING THE RESIST FILM, AND CHEMICAL AMPLIFICATION TYPE RESIST COMPOSITION FUJIFILM CORPORATION (JP) 2012-08-23 US disclosed