SCHEMBL12013263

SCHEMBL12013263

C#Cc1cnc(-c2cnc(C)s2)s1

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
HCAR2 Q8TDS4 1/20 0.32
CYP11B1 P15538 1/20 0.31
CYP11B2 P19099 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15482983 0.82
SCHEMBL13325291 0.76 NOS1 (0.41) HCAR2CYP11B1CYP11B2
SCHEMBL12013261 0.75 NOS1 (0.40) HCAR2CYP11B1CYP11B2
SCHEMBL10442596 0.72 HCAR2 (0.46) HCAR2CYP11B1CYP11B2
SCHEMBL16522148 0.68 NPC1 (0.35) HCAR2CYP11B1CYP11B2
SCHEMBL21320285 0.68
SCHEMBL15481045 0.67
SCHEMBL25165436 0.65 ADORA2A (0.30)
SCHEMBL20175445 0.65 HCAR2 (0.40) HCAR2CYP11B1CYP11B2
SCHEMBL15933073 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8252883-B2 Silicon cluster substituted with a conductive organic material; thin film transistor SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-08-28 US disclosed
US-8252883-B2 Silicon cluster substituted with a conductive organic material; thin film transistor SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-08-28 US disclosed
US-20080206479-A1 Organosilicon nanocluster, method of preparing the same and method of forming thin film using the same SAMSUNG ELECTRONICS CO., LTD 2008-08-28 US disclosed
US-20080206479-A1 Organosilicon nanocluster, method of preparing the same and method of forming thin film using the same SAMSUNG ELECTRONICS CO., LTD 2008-08-28 US disclosed