Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SCN1A | P35498 | 2/20 | 0.38 |
| ▸ | SCN2A | Q99250 | 2/20 | 0.38 |
| ▸ | SCN3A | Q9NY46 | 2/20 | 0.38 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.35 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.31 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.31 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.31 |
| ▸ | CDC25B | P30305 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12014441 | 0.86 | ADRB2 (0.31) | ADRB2ADRB1ADRB3TDP1ADORA3 | |
| SCHEMBL29319792 | 0.78 | ADORA3 (0.32) | ADORA3 | |
| SCHEMBL14749067 | 0.77 | SCN1A (0.37) | SCN1ASCN2ASCN3ACYP19A1ADRB2 | |
| SCHEMBL31077823 | 0.74 | SCN1A (0.54) | SCN1ASCN2ASCN3ACYP19A1TDP1 | |
| SCHEMBL3411398 | 0.74 | SCN1A (0.54) | SCN1ASCN2ASCN3ACYP19A1TDP1 | |
| SCHEMBL31192379 | 0.73 | SCN1A (0.52) | SCN1ASCN2ASCN3ACYP19A1TDP1 | |
| SCHEMBL304215 | 0.73 | SCN1A (0.52) | SCN1ASCN2ASCN3ACYP19A1TDP1 | |
| SCHEMBL14750844 | 0.72 | SCN1A (0.34) | SCN1ASCN2ASCN3ACYP19A1ADRB2 | |
| SCHEMBL29319752 | 0.72 | MAOB (0.40) | CYP19A1TDP1ADORA3ALDH1A1 | |
| SCHEMBL28350401 | 0.71 | SCN1A (0.33) | SCN1ASCN2ASCN3A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8778592-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-07-15 | — | — | US | disclosed |
| US-20120220112-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-30 | — | — | US | disclosed |