Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RIPK1 | Q13546 | 4/20 | 0.36 |
| ▸ | BRD4 | O60885 | 2/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | ELANE | P08246 | 3/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12015348 | 0.82 | ACE (0.32) | RIPK1 | |
| SCHEMBL12015354 | 0.82 | POLB (0.38) | RIPK1POLBELANE | |
| SCHEMBL12015340 | 0.75 | RIPK1 (0.38) | RIPK1POLB | |
| SCHEMBL12015349 | 0.73 | RIPK1 (0.37) | RIPK1POLB | |
| SCHEMBL12764306 | 0.73 | ELANE (0.33) | BRD4ELANE | |
| SCHEMBL12764300 | 0.73 | GSK3B (0.35) | RIPK1BRD4 | |
| SCHEMBL12015363 | 0.72 | RIPK1 (0.36) | RIPK1POLB | |
| SCHEMBL12015357 | 0.69 | CHRM2 (0.36) | RIPK1POLB | |
| SCHEMBL12015382 | 0.68 | CHRM2 (0.36) | RIPK1POLB | |
| SCHEMBL12015341 | 0.67 | CHRM2 (0.35) | RIPK1POLBELANE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9405191-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-02 | — | — | US | disclosed |
| US-20160077433-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-17 | — | — | US | disclosed |
| US-8859182-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-10-14 | — | — | US | disclosed |
| US-8563217-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-10-22 | — | — | US | disclosed |
| US-20130022910-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20120219898-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120219907-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |