Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP17A1 | P05093 | 1/20 | 0.33 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.33 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13225203 | 0.85 | CYP17A1 (0.32) | CYP17A1CYP19A1 | |
| SCHEMBL12017755 | 0.84 | CYP17A1 (0.37) | CYP17A1CYP19A1HSD11B1 | |
| SCHEMBL786326 | 0.84 | CYP17A1 (0.44) | CYP17A1CYP19A1ALDH1A1L3MBTL1 | |
| SCHEMBL13225205 | 0.84 | HSD11B1 (0.39) | CYP17A1CYP19A1HSD11B1 | |
| SCHEMBL12019098 | 0.84 | HSD11B1 (0.34) | HSD11B1 | |
| SCHEMBL14653701 | 0.80 | CYP17A1 (0.36) | CYP17A1CYP19A1 | |
| SCHEMBL13195560 | 0.79 | CYP17A1 (0.31) | CYP17A1CYP19A1 | |
| SCHEMBL12651557 | 0.79 | — | — | |
| SCHEMBL12651556 | 0.79 | MDH1 (0.31) | — | |
| SCHEMBL13195557 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9128373-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-09-08 | — | — | US | disclosed |
| US-8741543-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-06-03 | — | — | US | disclosed |
| US-20130022928-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20120258405-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-10-11 | — | — | US | disclosed |
| US-20120219912-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |