SCHEMBL12088221

SCHEMBL12088221

CCCN(CCOC(=O)CC)c1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CNR2 P34972 2/20 0.46
▸ SMN1; SMN2 Q16637 3/20 0.43
▸ KDM4E B2RXH2 1/20 0.42
▸ TP53 P04637 1/20 0.41
▸ NPSR1 Q6W5P4 1/20 0.41
▸ L3MBTL1 Q9Y468 1/20 0.41
▸ LMNA P02545 3/20 0.40
▸ CYP1A2 P05177 2/20 0.40
▸ CYP2D6 P10635 2/20 0.40
▸ HTT P42858 1/20 0.40
▸ NAAA Q02083 1/20 0.40
▸ RORC P51449 1/20 0.39
▸ CYP3A4 P08684 3/20 0.39
▸ ALDH1A1 P00352 2/20 0.39
▸ CYP2C9 P11712 2/20 0.39
▸ CYP2C19 P33261 2/20 0.39
▸ MEN1 O00255 1/20 0.39
▸ KMT2A Q03164 1/20 0.39
▸ TSHR P16473 2/20 0.39
▸ NFKB1 P19838 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22307534 0.95 SMN1; SMN2 (0.46) SMN1; SMN2KDM4ETP53LMNACYP1A2
SCHEMBL11829279 0.91 NAAA (0.45) CNR2SMN1; SMN2KDM4ETP53NPSR1
SCHEMBL25794082 0.90 NR1I2 (0.42) CNR2SMN1; SMN2KDM4ETP53LMNA
SCHEMBL17858617 0.89 SMN1; SMN2 (0.44) CNR2SMN1; SMN2KDM4ELMNACYP1A2
SCHEMBL9331718 0.86 SMN1; SMN2 (0.51) SMN1; SMN2KDM4ETP53LMNACYP1A2
SCHEMBL11836308 0.84 NAAA (0.51) CNR2SMN1; SMN2KDM4ETP53NPSR1
SCHEMBL11676375 0.83 LMNA (0.63) SMN1; SMN2NPSR1LMNACYP2D6ALDH1A1
SCHEMBL6212788 0.81 SMN1; SMN2 (0.45) SMN1; SMN2KDM4ETP53LMNACYP1A2
SCHEMBL11671827 0.81 CNR2 (0.43) CNR2SMN1; SMN2KDM4ETP53NPSR1
SCHEMBL11676173 0.81 NPC1 (0.52) SMN1; SMN2KDM4ETP53NPSR1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9057949-B2 Patterning process, resist composition, polymer, and polymerizable ester compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-06-16 — — US disclosed
US-9057949-B2 Patterning process, resist composition, polymer, and polymerizable ester compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-06-16 — — US disclosed
US-20130157194-A1 PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND POLYMERIZABLE ESTER COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-06-20 — — US disclosed
US-20130157194-A1 PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND POLYMERIZABLE ESTER COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-06-20 — — US disclosed
US-20120225386-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-09-06 — — US disclosed
Send feedback