SCHEMBL12128697

SCHEMBL12128697

CC(F)(F)C(=O)OCc1ccc2ccccc2c1

nearest known ligand 0.46

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 2/20 0.46
SLC1A3 P43003 1/20 0.45
SLC1A2 P43004 1/20 0.45
SLC1A1 P43005 1/20 0.45
RAB9A P51151 2/20 0.44
NPC1 O15118 1/20 0.44
GAA P10253 1/20 0.44
MAPT P10636 1/20 0.44
XBP1 P17861 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
TDP1 Q9NUW8 1/20 0.44
TACR1 P25103 1/20 0.43
CYP1A2 P05177 2/20 0.43
CYP2A6 P11509 1/20 0.43
MAOB P27338 1/20 0.41
PTPN1 P18031 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12128708 0.95 PTPN1 (0.42) ALOX5SLC1A3SLC1A2SLC1A1RAB9A
SCHEMBL12128576 0.90 ALDH1A1 (0.42) ALOX5SLC1A3SLC1A2SLC1A1RAB9A
SCHEMBL2077979 0.88 ALOX5 (0.44) ALOX5SLC1A3SLC1A2SLC1A1RAB9A
SCHEMBL25005847 0.88 SLC1A3 (0.47) ALOX5SLC1A3SLC1A2SLC1A1RAB9A
SCHEMBL12128717 0.87 CYP1A2 (0.46) ALOX5RAB9ANPC1GAAMAPT
SCHEMBL12128702 0.85 CYP1A2 (0.47) CYP1A2CYP2A6
SCHEMBL13823922 0.84 ALOX5 (0.47) ALOX5SLC1A3SLC1A2SLC1A1RAB9A
SCHEMBL24142227 0.84 SLC1A3 (0.44) ALOX5SLC1A3SLC1A2SLC1A1RAB9A
SCHEMBL2605925 0.81 SLC1A3 (0.42) ALOX5SLC1A3SLC1A2SLC1A1RAB9A
SCHEMBL12128693 0.80 ALDH1A1 (0.58) RAB9ANPC1SMN1; SMN2TDP1PTPN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8062830-B2 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-11-22 US disclosed
US-20110189618-A1 RESIST PROCESSING METHOD SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-08-04 US disclosed
US-20110183264-A1 RESIST PROCESSING METHOD AND USE OF POSITIVE TYPE RESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-07-28 US disclosed
US-20110171586-A1 RESIST PROCESSING METHOD SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-07-14 US disclosed
US-20110091820-A1 RESIST PROCESSING METHOD SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-04-21 US disclosed
US-20110091818-A1 PROCESS FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-04-21 US disclosed