SCHEMBL12149358

SCHEMBL12149358

CC(OCC1CCC(COC(C)OC(=O)CCC(C)(P)C#N)CC1)OC(=O)CCC(C)(P)C#N

nearest known ligand 0.30

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
CTSS P25774 1/20 0.30
CTSK P43235 1/20 0.30
CNR2 P34972 1/20 0.30
SLC1A3 P43003 2/20 0.30
SLC1A2 P43004 2/20 0.30
SLC1A1 P43005 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10068121 0.95
SCHEMBL12148838 0.92
SCHEMBL786044 0.87 CTSK (0.32) CTSSCTSKCNR2SLC1A3SLC1A2
SCHEMBL10068110 0.82 LMNA (0.31)
SCHEMBL12149359 0.81
SCHEMBL12149357 0.79
SCHEMBL10068107 0.79 CTSK (0.33) CTSSCTSK
SCHEMBL10068116 0.78
SCHEMBL10068108 0.77
SCHEMBL10068113 0.74 EPHX2 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8067516-B2 Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography MARUZEN PETROCHEMICAL CO., LTD. (JP) 2011-11-29 US disclosed
US-20070269741-A1 Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography MARUZEN PETROCHEMICAL CO., LTD. (JP) 2007-11-22 US disclosed