SCHEMBL12153641

SCHEMBL12153641

C=CC(=O)OCC(=O)OC12CC3(O)CC(O)(CC(OCC)(C3)C1C)C2

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
HPGD P15428 1/20 0.31
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12153645 0.93
SCHEMBL12153649 0.88 HPGD (0.31) HPGDTSHR
SCHEMBL12153611 0.87
SCHEMBL12153640 0.86
SCHEMBL685101 0.86 TSHR (0.31) HPGDTSHR
SCHEMBL10171517 0.85 TSHR (0.30) TSHR
SCHEMBL12153637 0.83 THRB (0.33) TSHR
SCHEMBL12153639 0.81 ALDH1A1 (0.32) HPGDTSHR
SCHEMBL12153625 0.80
SCHEMBL4401030 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8048612-B2 Polymer and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-11-01 US disclosed
US-20090317744-A1 POLYMER AND CHEMICALLY AMPLIFIED RESIST COMPOSITION COMPRISING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-12-24 US disclosed