Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5693985 | 1.00 | ALDH1A1 (0.36) | ALDH1A1 | |
| SCHEMBL5704689 | 1.00 | ALDH1A1 (0.36) | ALDH1A1 | |
| SCHEMBL197030 | 0.91 | ALDH1A1 (0.41) | ALDH1A1 | |
| SCHEMBL29083169 | 0.89 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL500083 | 0.88 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL15357312 | 0.86 | ALDH1A1 (0.30) | ALDH1A1 | |
| SCHEMBL22142556 | 0.86 | ALDH1A1 (0.35) | ALDH1A1 | |
| SCHEMBL594846 | 0.86 | ALDH1A1 (0.35) | ALDH1A1 | |
| SCHEMBL22118489 | 0.86 | ALDH1A1 (0.35) | ALDH1A1 | |
| SCHEMBL22118505 | 0.86 | ALDH1A1 (0.35) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 118 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7135133-B2 | Improved efficiency due to control of profile of refractive index distribution and stable high temperature operation | NANOPTICS, INC. (US) | 2006-11-14 | — | — | US | claimed |
| US-6892011-B2 | Method and apparatus for fabrication of plastic fiber optic block materials and large flat panel displays | FLORIDA, UNIVERSITY OF | 2005-05-10 | — | — | US | claimed |
| EP-1272336-A2 | METHOD AND APPARATUS FOR MANUFACTURING PLASTIC OPTICAL TRANSMISSION MEDIUM | Nanoptics, Inc. (US) | 2003-01-08 | — | — | EP | claimed |
| US-20020041042-A1 | Method and apparatus for manufacturing plastic optical transmission medium | NANOPTICS, INC. | 2002-04-11 | — | — | US | claimed |
| WO-2001078972-A2 | METHOD AND APPARATUS FOR MANUFACTURING PLASTIC OPTICAL TRANSMISSION MEDIUM | NANOPTICS, INC. (US) | 2001-10-25 | — | — | WO | claimed |
| US-20250110101-A1 | PER AND POLYFLUOROALKYL SUBSTANCE MEASUREMENT | DEXSIL CORPORATION (US) | 2025-04-03 | — | — | US | disclosed |
| US-20240043593-A1 | Fluorine-Containing Polymer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-02-08 | — | — | US | disclosed |
| CN-116848162-A | Fluorine-containing polymer | 中央硝子株式会社 | 2023-10-03 | — | — | CN | disclosed |
| WO-2022124183-A1 | FLUORINE-CONTAINING POLYMER | セントラル硝子株式会社 | 2022-06-16 | — | — | WO | disclosed |
| US-9086628-B2 | Resist protective film-forming composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-21 | — | — | US | disclosed |
| US-8933251-B2 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-01-13 | — | — | US | disclosed |
| US-20130231491-A1 | FLUORINATED MONOMER OF CYCLIC ACETAL STRUCTURE, POLYMER, RESIST PROTECTIVE COATING COMPOSITION, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-09-05 | — | — | US | disclosed |
| US-20020051935-A1 | Resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2002-05-02 | — | — | US | disclosed |
| US-20020051936-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-05-02 | — | — | US | disclosed |
| US-20020048724-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-04-25 | — | — | US | disclosed |
| US-20020004569-A1 | Polymer, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-01-10 | — | — | US | disclosed |
| US-20010038969-A1 | Novel polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. OF (JP) | 2001-11-08 | — | — | US | disclosed |
| US-20010033989-A1 | Novel polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-25 | — | — | US | disclosed |
| US-20010018162-A1 | Novel polymers, chemical amplification resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1126322-A2 | Fluorine-containing polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-22 | — | — | EP | disclosed |