SCHEMBL1218797

SCHEMBL1218797

C=CCOC(=O)C1CCCC(C(=O)OCC=C)C1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.39
GAA P10253 1/20 0.39
KMT2A Q03164 3/20 0.37
CYP3A4 P08684 1/20 0.35
TSHR P16473 2/20 0.33
MAPT P10636 1/20 0.33
CACNA1B Q00975 1/20 0.33
APBA1 Q02410 1/20 0.33
HTT P42858 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
POLB P06746 1/20 0.33
MAPK1 P28482 1/20 0.33
CASP1 P29466 1/20 0.33
MEN1 O00255 1/20 0.33
ATM Q13315 1/20 0.33
NPSR1 Q6W5P4 1/20 0.32
MMP1 P03956 1/20 0.32
MMP2 P08253 1/20 0.32
MMP3 P08254 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1218799 0.93 ANPEP (0.36) ALDH1A1GAAKMT2ACYP3A4TSHR
SCHEMBL7133197 0.92 ALDH1A1 (0.41) ALDH1A1GAAKMT2ACYP3A4TSHR
SCHEMBL14684887 0.90 ALDH1A1 (0.35) ALDH1A1GAAKMT2ACYP3A4TSHR
SCHEMBL6350238 0.88 ALDH1A1 (0.44) ALDH1A1GAAKMT2ACYP3A4TSHR
SCHEMBL3291388 0.88 ALDH1A1 (0.35) ALDH1A1GAAKMT2ACYP3A4TSHR
SCHEMBL1326021 0.88 CYP3A4 (0.39) ALDH1A1GAAKMT2ACYP3A4TSHR
SCHEMBL3794014 0.87 ALDH1A1 (0.34) ALDH1A1GAAKMT2ACYP3A4CASP1
SCHEMBL634058 0.86 ALDH1A1 (0.46) ALDH1A1GAAKMT2ACYP3A4MAPT
SCHEMBL15442983 0.86 ALDH1A1 (0.46) ALDH1A1GAAKMT2ACYP3A4MAPT
SCHEMBL15443027 0.86 ALDH1A1 (0.46) ALDH1A1GAAKMT2ACYP3A4MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 144 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115812073-A Production and use of plasticizers based on the 2, 4-isomer of furan dicarboxylic acid diesters 布拉斯科有限公司 2023-03-17 CN claimed
US-9534104-B2 Plasticizer blends and use thereof EXXONMOBIL CHEMICAL PATENTS INC. (US) 2017-01-03 US claimed
WO-2015112285-A1 PLASTICIZER BLENDS AND USE THEREOF EXXONMOBIL CHEMICAL PATENTS INC. (US) 2015-07-30 WO claimed
US-20140315021-A1 Plasticizer Blends and Use Thereof EXXONMOBIL CHEMICAL PATENTS INC. 2014-10-23 US claimed
JP-7033830-A None JP disclosed
US-20250353962-A1 PHOTOPOLYMERIZABLE THERMOPLASTICS AND METHODS OF MAKING AND USING SAME UNIV COLORADO REGENTS (US) 2025-11-20 US disclosed
US-12410283-B2 Photopolymerizable thermoplastics and methods of making and using same THE REGENTS OF THE UNIVERSITY OF COLORADO (US) 2025-09-09 US disclosed
EP-4596639-A1 ACTIVE ENERGY RAY-CURABLE INK COMPOSITION Osaka Soda Co., Ltd. (JP) 2025-08-06 EP disclosed
US-20250215249-A1 ACTIVE ENERGY RAY-CURABLE INK COMPOSITION SAKATA INX CORPORATION (JP) 2025-07-03 US disclosed
EP-4026857-B1 PHOTOCURABLE RESIN COMPOSITION, INK AND PAINT OSAKA SODA CO LTD (JP) 2025-06-04 EP disclosed
WO-2025078827-A1 PRINTING INK FUJIFILM SPECIALITY INK SYSTEMS LIMITED (GB) 2025-04-17 WO disclosed
CN-119731277-A Active energy ray-curable ink composition 株式会社大阪曹达 2025-03-28 CN disclosed
WO-2001096274-A1 PRODUCTION OF ALICYCLIC (METH)ALLYL ESTERS FOR PLASTIC LENS COMPOSITIONS SHOWA DENKO K. K. (JP) 2001-12-20 WO disclosed
WO-2001077718-A2 PLASTIC LENS MATERIAL, PRODUCTION PROCESS OF THE MATERIAL, COMPOSITION FOR PLASTIC LENS, PLASTIC LENS OBTAINED BY CURING THE COMPOSITION, AND PRODUCTION PROCESS OF THE PLASTIC LENS SHOWA DENKO K.K. (JP) 2001-10-18 WO disclosed
CN-1301354-A Resin composition for plastic lens use and plastic lens SHOWA DENKO KK (JP) 2001-06-27 CN disclosed
EP-1085350-A1 RESIN COMPOSITION FOR PLASTIC LENS USE AND PLASTIC LENS Showa Denko Kabushiki Kaisha (JP) 2001-03-21 EP disclosed
EP-0593877-B1 Composition for optical material SHOWA DENKO KK (JP) 1999-01-27 EP disclosed
JP-H0733830-A ORGANIC GLASS FOR OPTICAL MATERIAL SHOWA DENKO KK 1995-02-03 JP disclosed
US-5380809-A Composition for optical material SHOWA DENKO K.K. (JP) 1995-01-10 US disclosed
EP-0593877-A1 Composition for optical material SHOWA DENKO KABUSHIKI KAISHA (JP) 1994-04-27 EP disclosed