⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ether SCHEMBL9675710 | 1.00 | — | — | |
| Ether SCHEMBL6325249 | 1.00 | ALDH1A1 (0.41) | — | |
| Ether SCHEMBL6 | 0.89 | — | — | |
| Ether SCHEMBL21406 | 0.89 | ALDH1A1 (0.47) | — | |
| Ether SCHEMBL9248046 | 0.89 | ALDH1A1 (0.47) | — | |
| Ether SCHEMBL9248674 | 0.89 | ALDH1A1 (0.47) | — | |
| Ether SCHEMBL8160191 | 0.89 | ALDH1A1 (0.47) | — | |
| Ether SCHEMBL3653511 | 0.84 | — | — | |
| Ether SCHEMBL1312666 | 0.84 | ALDH1A1 (0.44) | — | |
| Ether SCHEMBL10719709 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 374 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230335783-A1 | LITHIUM SECONDARY BATTERY | PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) | 2023-10-19 | — | — | US | claimed |
| EP-4224551-A1 | LITHIUM SECONDARY BATTERY | Panasonic Intellectual Property Management Co., Ltd. (JP) | 2023-08-09 | — | — | EP | claimed |
| CN-112267121-B | Cleaning agent and application thereof | 广州亦盛环保科技有限公司 | 2022-09-20 | — | — | CN | claimed |
| WO-2022070646-A1 | LITHIUM SECONDARY BATTERY | パナソニックＩＰマネジメント株式会社 | 2022-04-07 | — | — | WO | claimed |
| CN-111056765-B | Defoaming agent applied to thin-layer self-leveling mortar and preparation method thereof | 江苏四新科技应用研究所股份有限公司 | 2021-11-19 | — | — | CN | claimed |
| CN-111056765-A | Defoaming agent applied to thin-layer self-leveling mortar and preparation method thereof | 江苏四新科技应用研究所股份有限公司 | 2020-04-24 | — | — | CN | claimed |
| CN-1215420-A | Cationically polymerizable compositions applicable with electrostatic assistance | MINNESOTA MINING & MFG (US) | 1999-04-28 | — | — | CN | claimed |
| US-5661206-A | MODIFYING THE FLUIDITY BY ADDING OXYALKYLENE BASED DEFOAMING AGENT; EXTENDED SHELF-LIFE | MBT HOLDING AG (CH) | 1997-08-26 | — | — | US | claimed |
| US-3932179-A | Electrophotographic element containing a polymeric multi-phase interlayer | EASTMAN KODAK COMPANY (US) | 1976-01-13 | — | — | US | claimed |
| JP-10029996-A | — | — | None | — | — | JP | disclosed |
| JP-10029996-A | — | — | None | — | — | JP | disclosed |
| WO-2024128013-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, METHOD FOR FORMING RESIST UNDERLAYER FILM AND METHOD FOR PRODUCING METAL COMPOUND | JSR株式会社 | 2024-06-20 | — | — | WO | disclosed |
| US-20240184203-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | JSR CORPORATION (JP) | 2024-06-06 | — | — | US | disclosed |
| US-20240018046-A1 | EARLY STRENGTH SLAG-BASED CEMENTITIOUS BINDER | GCP APPLIED TECH INC (US) | 2024-01-18 | — | — | US | disclosed |
| WO-1992006951-A1 | DIACETYLENE ETHERS | ISP INVESTMENTS INC. (US) | 1992-04-30 | — | — | WO | disclosed |
| US-5095134-A | Thermochromic diacetylene ethers containing ester or urethane groups | ISP INVESTMENTS INC. (US) | 1992-03-10 | — | — | US | disclosed |
| EP-0291327-A2 | Aryl-substituted naphthalene, benzoxepine, benzazepine and benzocycloheptene derivatives | SCHERING CORPORATION (US) | 1988-11-17 | — | — | EP | disclosed |
| US-4536391-A | REACTING A PLASMIN HEAVY CHAIN WITH UROKINASE IN THE PRESENCE OF A COUPLING AGENT | OTSUKA PHARMACEUTICAL CO. (JP) | 1985-08-20 | — | — | US | disclosed |
| EP-0109653-A2 | Process for preparing urokinase complex | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 1984-05-30 | — | — | EP | disclosed |
| US-3932179-A | Electrophotographic element containing a polymeric multi-phase interlayer | EASTMAN KODAK COMPANY (US) | 1976-01-13 | — | — | US | disclosed |