Ether

Ether

SCHEMBL6325249

C#C.CCOCC.CCOCC

nearest known ligand 0.41

Full drug profile on Sugi Atlas →

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.41
TSHR P16473 1/20 0.32
THRB P10828 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ether SCHEMBL9675710 1.00
Ether SCHEMBL1219153 1.00
Ether SCHEMBL6 0.89
Ether SCHEMBL21406 0.89 ALDH1A1 (0.47) ALDH1A1TSHRTHRB
Ether SCHEMBL9248046 0.89 ALDH1A1 (0.47) ALDH1A1TSHRTHRB
Ether SCHEMBL9248674 0.89 ALDH1A1 (0.47) ALDH1A1TSHRTHRB
Ether SCHEMBL8160191 0.89 ALDH1A1 (0.47) ALDH1A1TSHRTHRB
Ether SCHEMBL3653511 0.84
Ether SCHEMBL1312666 0.84 ALDH1A1 (0.44) ALDH1A1TSHRTHRB
Ether SCHEMBL10719709 0.84

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20040102020-A1 Method for bonding and debonding films using a high-temperature polymer ROBERDS BRIAN (US) 2004-05-27 US claimed
US-6638835-B2 Method for bonding and debonding films using a high-temperature polymer INTEL CORPORATION 2003-10-28 US claimed
US-20030191275-A1 Solvent systems for polymeric dielectric materials HONEYWELL INTERNATIONAL INC. 2003-10-09 US claimed
US-20030170424-A1 Method for bonding and debonding films using a high-temperature polymer ROBERDS BRIAN (US) 2003-09-11 US claimed
US-20030108715-A1 Method for bonding and debonding films using a high-temperature polymer INTEL CORPORATION 2003-06-12 US claimed
US-20020183476-A1 Solvent systems for polymeric dielectric materials HONEYWELL INTERNATIONAL INC. 2002-12-05 US claimed
US-6413202-B1 USING AROMATIC ETHER SOLVENT ALLIEDSIGNAL, INC. 2002-07-02 US claimed
WO-2000043836-A1 SOLVENT SYSTEMS FOR POLYMERIC DIELECTRIC MATERIALS ALLIEDSIGNAL INC. (US) 2000-07-27 WO claimed
WO-1999038910-A1 SOLVENT SYSTEMS FOR LOW DIELECTRIC CONSTANT POLYMERIC MATERIALS ALLIEDSIGNAL, INC. (US) 1999-08-05 WO claimed
US-6878796-B2 Solvent systems for polymeric dielectric materials HONEYWELL INTERNATIONAL INC. (US) 2005-04-12 US disclosed
US-6780517-B2 FOR USE IN SEMICONDUCTOR DEVICES HONEYWELL INTERNATIONAL INC. 2004-08-24 US disclosed
US-6761975-B1 RESISTANCE TO DELAMINATION; ELIMINATES THE NEED FOR A PRIMER COATING APPLICATION PROCESS STEP; CURABLE POLYARYL ETHER FILM HONEYWELL INTERNATIONAL INC. 2004-07-13 US disclosed
US-20040102020-A1 Method for bonding and debonding films using a high-temperature polymer ROBERDS BRIAN (US) 2004-05-27 US disclosed
US-6638835-B2 Method for bonding and debonding films using a high-temperature polymer INTEL CORPORATION 2003-10-28 US disclosed
EP-1243003-A1 POLYCARBOSILANE ADHESION PROMOTERS FOR LOW DIELECTRIC CONSTANT POLYMERIC MATERIALS AlliedSignal Inc. (US) 2002-09-25 EP disclosed
US-6413202-B1 USING AROMATIC ETHER SOLVENT ALLIEDSIGNAL, INC. 2002-07-02 US disclosed
US-6291628-B1 USED FOR FORMING A DIELECTRIC FILM ON A SUBSTRATE BY SPIN-COATING; IN MICROELECTRONIC DEVICES ALLIED SIGNAL INC. 2001-09-18 US disclosed
WO-2001046963-A1 POLYCARBOSILANE ADHESION PROMOTERS FOR LOW DIELECTRIC CONSTANT POLYMERIC MATERIALS ALLIEDSIGNAL INC. (US) 2001-06-28 WO disclosed
WO-2000043836-A1 SOLVENT SYSTEMS FOR POLYMERIC DIELECTRIC MATERIALS ALLIEDSIGNAL INC. (US) 2000-07-27 WO disclosed
WO-1999038910-A1 SOLVENT SYSTEMS FOR LOW DIELECTRIC CONSTANT POLYMERIC MATERIALS ALLIEDSIGNAL, INC. (US) 1999-08-05 WO disclosed