SCHEMBL12199750

SCHEMBL12199750

CC(C)C(C(=O)OC(C)(C)C)(C(=O)OC(C)(C)C)C(C)C

nearest known ligand 0.48

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
DGAT1 O75907 1/20 0.48
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
CA7 P43166 1/20 0.36
CA12 O43570 1/20 0.33
CA14 Q9ULX7 1/20 0.33
CYP2D6 P10635 1/20 0.32
MEN1 O00255 1/20 0.31
GAA P10253 1/20 0.31
KMT2A Q03164 1/20 0.31
CTSS P25774 1/20 0.31
CTSK P43235 1/20 0.31
APLNR P35414 1/20 0.31
USP2 O75604 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30
HRH3 Q9Y5N1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15965830 0.78 DGAT1 (0.48) DGAT1CA1CA2CA7CA12
SCHEMBL13206619 0.78 DGAT1 (0.48) DGAT1CA1CA2CA7CA12
SCHEMBL15159138 0.75 CYP2D6 (0.37) DGAT1CA1CA2CA7CA12
SCHEMBL15159178 0.75 ALDH1A1 (0.35)
SCHEMBL4676907 0.74 DGAT1 (0.50) DGAT1CA1CA2CA7CA12
SCHEMBL234272 0.74 DGAT1 (0.44) DGAT1CA12CA14KMT2ASMN1; SMN2
SCHEMBL5895740 0.74 DGAT1 (0.44) DGAT1CA1CA2CA7CA12
SCHEMBL14408786 0.74 DGAT1 (0.44) DGAT1CA1CA2CA7CA12
SCHEMBL13478314 0.74 DGAT1 (0.44) DGAT1CA1CA2CA7CA12
SCHEMBL5326515 0.74 DGAT1 (0.44) DGAT1CA1CA2CA7CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105837714-A METHOD FOR PRODUCING SOLID CATALYST COMPONENT FOR USE IN POLYMERIZATION OF OLEFIN, CATALYST FOR USE IN POLYMERIZATION OF OLEFIN, AND METHOD FOR PRODUCING OLEFIN POLYMER 东邦钛株式会社 2016-08-10 CN disclosed
US-8956802-B2 Pattern forming method, chemical amplification resist composition and resist film FUJIFILM CORPORATION (JP) 2015-02-17 US disclosed
US-20130202999-A1 PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2013-08-08 US disclosed
US-8034546-B2 Methanofullerene derivative being chemically amplified by including in the coating layer at least one additional component which increases the sensitivity of the exposed layer to actinic radiation which is subsequently used to pattern the layer THE UNIVERSITY OF BIRMINGHAM (GB) 2011-10-11 US disclosed