Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DPP8 | Q6V1X1 | 5/20 | 0.39 |
| ▸ | DPP9 | Q86TI2 | 5/20 | 0.39 |
| ▸ | DPP4 | P27487 | 3/20 | 0.37 |
| ▸ | NAAA | Q02083 | 1/20 | 0.33 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.33 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | GLMN | Q92990 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | GLA | P06280 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9925222 | 0.93 | DPP8 (0.33) | DPP8DPP9DPP4NAAACYP17A1 | |
| SCHEMBL13563627 | 0.85 | CYP17A1 (0.35) | DPP8DPP9DPP4CYP17A1CYP19A1 | |
| SCHEMBL2625704 | 0.85 | DPP4 (0.40) | DPP8DPP9DPP4CYP17A1CYP19A1 | |
| SCHEMBL14802697 | 0.85 | CYP17A1 (0.35) | DPP8DPP9DPP4CYP17A1CYP19A1 | |
| SCHEMBL15905714 | 0.85 | CYP17A1 (0.35) | DPP8DPP9DPP4CYP17A1CYP19A1 | |
| SCHEMBL5608925 | 0.84 | THRB (0.42) | DPP8DPP9DPP4NAAATHRB | |
| SCHEMBL2607818 | 0.83 | CYP17A1 (0.34) | DPP8DPP9DPP4CYP17A1CYP19A1 | |
| SCHEMBL9925210 | 0.83 | CYP17A1 (0.34) | DPP8DPP9DPP4CYP17A1CYP19A1 | |
| SCHEMBL14183864 | 0.83 | CYP17A1 (0.34) | DPP8DPP9DPP4CYP17A1CYP19A1 | |
| SCHEMBL12109911 | 0.83 | CYP17A1 (0.34) | DPP8DPP9DPP4CYP17A1CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8987386-B2 | Method of producing polymeric compound, resist composition, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-03-24 | — | — | US | disclosed |
| US-8658343-B2 | Resist composition, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-02-25 | — | — | US | disclosed |
| US-20120328993-A1 | METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-12-27 | — | — | US | disclosed |
| US-20120148953-A1 | Resist composition, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-06-14 | — | — | US | disclosed |