⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10282093 | 0.88 | HMGCR (0.37) | — | |
| SCHEMBL13638244 | 0.85 | — | — | |
| SCHEMBL13966959 | 0.82 | — | — | |
| SCHEMBL21291498 | 0.81 | PPARG (0.32) | — | |
| SCHEMBL328506 | 0.81 | KDM4E (0.31) | — | |
| SCHEMBL12223222 | 0.80 | — | — | |
| SCHEMBL13081846 | 0.80 | PRKCA (0.30) | — | |
| SCHEMBL10134648 | 0.80 | — | — | |
| SCHEMBL13146123 | 0.79 | SMN1; SMN2 (0.31) | — | |
| SCHEMBL12015727 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20110244394-A1 | METHOD FOR PRODUCING RESIN SOLUTION FOR PHOTORESIST, PHOTORESIST COMPOSITION, AND PATTERN-FORMING METHOD | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2011-10-06 | — | — | US | disclosed |