Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | RECQL | P46063 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | ATM | Q13315 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1704827 | 0.88 | ALDH1A1 (0.31) | — | |
| SCHEMBL12998836 | 0.87 | TSHR (0.32) | — | |
| SCHEMBL13638244 | 0.87 | — | — | |
| SCHEMBL686464 | 0.82 | KDM4E (0.33) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL10134648 | 0.81 | — | — | |
| SCHEMBL12015727 | 0.80 | — | — | |
| SCHEMBL10231851 | 0.80 | KDM4E (0.34) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL786728 | 0.80 | KDM4E (0.34) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL13081846 | 0.79 | PRKCA (0.30) | — | |
| SCHEMBL13146123 | 0.78 | SMN1; SMN2 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20130017377-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2013-01-17 | — | — | US | disclosed |
| US-20130011785-A1 | PATTERN FORMING METHOD AND RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2013-01-10 | — | — | US | disclosed |
| US-8304164-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-11-06 | — | — | US | disclosed |
| US-20120264054-A1 | PATTERN FORMING METHOD, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-10-18 | — | — | US | disclosed |
| US-20120219902-A1 | PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-08-30 | — | — | US | disclosed |
| EP-2492750-A1 | Photoresist compositions and methods of forming photolithographic patterns | Rohm and Haas Electronic Materials LLC (US) | 2012-08-29 | — | — | EP | disclosed |
| US-20120202150-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2012-08-09 | — | — | US | disclosed |
| US-8236971-B2 | Polycyclic ester containing cyano group and lactone skeleton | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2012-08-07 | — | — | US | disclosed |
| US-20120156618-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-06-21 | — | — | US | disclosed |
| US-20120088190-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-04-12 | — | — | US | disclosed |
| US-7794916-B2 | Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2010-09-14 | — | — | US | disclosed |
| US-7750101-B2 | Polycyclic ester containing cyano group and lactone skeleton | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-07-06 | — | — | US | disclosed |
| US-20100081778-A1 | POLYCYCLIC ESTER CONTAINING CYANO GROUP AND LACTONE SKELETON | INOUE KEIZO | 2010-04-01 | — | — | US | disclosed |
| US-20100062365-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-03-11 | — | — | US | disclosed |
| US-20100040972-A1 | PATTERN FORMING METHOD, AND RESIST COMPOSITION, DEVELOPER AND RINSING SOLUTION USED IN THE PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2010-02-18 | — | — | US | disclosed |
| US-20100040975-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-02-18 | — | — | US | disclosed |
| US-20090274975-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH | FUJIFILM CORPORATION (JP) | 2009-11-05 | — | — | US | disclosed |
| US-20090264565-A1 | POLYMER AND CHEMICALLY AMPLIFIED RESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-10-22 | — | — | US | disclosed |
| US-20090263742-A1 | liquid immersion lithography, solves problem of defect caused by residual fluid droplets on the resist film; blend of resin containing no fluorine and acid labile group, and an acrylic fluoro-copolymer with units of a fluoromonomer and units of acid labile, lactone, or hydroxy-functional group | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-10-22 | — | — | US | disclosed |
| US-20080319160-A1 | Polycyclic Ester Containing Cyano Group and Lactone Skeleton | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2008-12-25 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120088190-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | AFF1, FGFR1, FRG1 | KDM4E 3654/4885NPC1 425/4885POLB 2638/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.