⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5251 | 1.00 | CTSL (0.39) | — | |
| SCHEMBL5494 | 1.00 | CTSL (0.39) | — | |
| SCHEMBL245776 | 0.97 | — | — | |
| SCHEMBL5243 | 0.91 | — | — | |
| SCHEMBL131877 | 0.84 | — | — | |
| SCHEMBL23039739 | 0.75 | CTSL (0.41) | — | |
| SCHEMBL16239892 | 0.75 | CTSL (0.41) | — | |
| SCHEMBL11682621 | 0.75 | CTSL (0.41) | — | |
| SCHEMBL869115 | 0.75 | CTSL (0.41) | — | |
| SCHEMBL379081 | 0.75 | CTSL (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 379 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2955575-B1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLYPHENOL DERIVATIVE USED IN SAME | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-07-29 | — | — | EP | claimed |
| US-9897913-B2 | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-02-20 | — | — | US | claimed |
| CN-103102251-B | Radiation-ray sensitive composition | MITSUBISHI GAS CHEMICAL INC. (JP) | 2016-01-20 | — | — | CN | claimed |
| US-20150030980-A1 | RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2015-01-29 | — | — | US | claimed |
| CN-104281006-A | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO | 2015-01-14 | — | — | CN | claimed |
| US-20090042957-A1 | Substituted Oxyarenes | BAYER CROPSCIENCE AG (DE) | 2009-02-12 | — | — | US | claimed |
| EP-1831145-A1 | SUBSTITUTED OXYARENES | Bayer CropScience Aktiengesellschaft (DE) | 2007-09-12 | — | — | EP | claimed |
| WO-2006069685-A1 | SUBSTITUTED OXYARENES | BAYER CROPSCIENCE AKTIENGESELLSCHAFT (DE) | 2006-07-06 | — | — | WO | claimed |
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-12-26 | — | — | US | disclosed |
| EP-4219477-A1 | CYANOTRIAZOLE COMPOUNDS | Otsuka Pharmaceutical Co., Ltd. (JP) | 2023-08-02 | — | — | EP | disclosed |
| US-20230185191-A1 | COMPOUND, PRODUCTION METHOD THEREFOR, ACID GENERATOR, COMPOSITION, RESIST FILM, UNDERLAYER FILM, PATTERN FORMATION METHOD, AND OPTICAL COMPONENT | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-06-15 | — | — | US | disclosed |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-02-07 | — | — | US | disclosed |
| CN-115605458-A | Compound and method for producing same, acid generator, composition, resist film, underlayer film, pattern formation method, and optical article | 学校法人关西大学（JP） | 2023-01-13 | — | — | CN | disclosed |
| CN-115093408-A | Benzylamine-containing 5, 6-heteroaromatic compounds useful against mycobacterial infections | 盐野义制药株式会社 | 2022-09-23 | — | — | CN | disclosed |
| US-5300501-A | Metalloproteinase inhibitors | CELLTECH LIMITED (GB) | 1994-04-05 | — | — | US | disclosed |
| EP-0581923-A1 | PHOSPHONO DERIVATIVES OF AMINO ACIDS AS METALLOPROTEINASE INHIBITORS | CELLTECH THERAPEUTICS LIMITED (GB) | 1994-02-09 | — | — | EP | disclosed |
| WO-1993024449-A1 | PEPTIDYL DERIVATIVES AND THEIR USE AS METALLOPROTEINASES INHIBITORS | CELLTECH LIMITED (GB) | 1993-12-09 | — | — | WO | disclosed |
| WO-1993024475-A1 | SULPHAMIDE DERIVATIVES AS METALLOPROTEINASE INHIBITORS | CELLTECH LIMITED (GB) | 1993-12-09 | — | — | WO | disclosed |
| WO-1993014096-A1 | PHOSPHONO DERIVATIVES OF AMINO ACIDS AS METALLOPROTEINASE INHIBITORS | CELLTECH LIMITED (GB) | 1993-07-22 | — | — | WO | disclosed |
| WO-1992009565-A1 | PEPTIDYL DERIVATIVES | CELLTECH LIMITED (GB) | 1992-06-11 | — | — | WO | disclosed |