Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTSL | P07711 | 1/20 | 0.39 |
| ▸ | CTSB | P07858 | 1/20 | 0.39 |
| ▸ | CTSK | P43235 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | SLC1A3 | P43003 | 3/20 | 0.35 |
| ▸ | SLC1A2 | P43004 | 3/20 | 0.35 |
| ▸ | SLC1A1 | P43005 | 3/20 | 0.35 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.35 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.35 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.35 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.35 |
| ▸ | PARP15 | Q460N3 | 2/20 | 0.33 |
| ▸ | PARP10 | Q53GL7 | 2/20 | 0.33 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.32 |
| ▸ | ADH1B | P00325 | 1/20 | 0.32 |
| ▸ | ADH1C | P00326 | 1/20 | 0.32 |
| ▸ | ADH1A | P07327 | 1/20 | 0.32 |
| ▸ | ADH4 | P08319 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12258 | 1.00 | — | — | |
| SCHEMBL5251 | 1.00 | CTSL (0.39) | CTSLCTSBCTSKLMNASLC1A3 | |
| SCHEMBL245776 | 0.97 | — | — | |
| SCHEMBL5243 | 0.91 | — | — | |
| SCHEMBL131877 | 0.84 | — | — | |
| SCHEMBL23039739 | 0.75 | CTSL (0.41) | CTSLCTSBCTSKLMNASLC1A3 | |
| SCHEMBL16239892 | 0.75 | CTSL (0.41) | CTSLCTSBCTSKLMNASLC1A3 | |
| SCHEMBL11682621 | 0.75 | CTSL (0.41) | CTSLCTSBCTSKLMNASLC1A3 | |
| SCHEMBL869115 | 0.75 | CTSL (0.41) | CTSLCTSBCTSKLMNASLC1A3 | |
| SCHEMBL379081 | 0.75 | CTSL (0.41) | CTSLCTSBCTSKLMNASLC1A3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 195 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2955575-B1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLYPHENOL DERIVATIVE USED IN SAME | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-07-29 | — | — | EP | claimed |
| US-9897913-B2 | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-02-20 | — | — | US | claimed |
| US-20150030980-A1 | RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2015-01-29 | — | — | US | claimed |
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-12-26 | — | — | US | disclosed |
| EP-4219477-A1 | CYANOTRIAZOLE COMPOUNDS | Otsuka Pharmaceutical Co., Ltd. (JP) | 2023-08-02 | — | — | EP | disclosed |
| US-20230185191-A1 | COMPOUND, PRODUCTION METHOD THEREFOR, ACID GENERATOR, COMPOSITION, RESIST FILM, UNDERLAYER FILM, PATTERN FORMATION METHOD, AND OPTICAL COMPONENT | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-06-15 | — | — | US | disclosed |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-02-07 | — | — | US | disclosed |
| CN-115605458-A | Compound and method for producing same, acid generator, composition, resist film, underlayer film, pattern formation method, and optical article | 学校法人关西大学（JP） | 2023-01-13 | — | — | CN | disclosed |
| US-20220144738-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD, AND METHOD FOR PURIFYING RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-05-12 | — | — | US | disclosed |
| US-11256170-B2 | Compound, resist composition, and method for forming resist pattern using it | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-02-22 | — | — | US | disclosed |
| US-11243467-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-02-08 | — | — | US | disclosed |
| US-20070059632-A1 | Method of manufacturing a semiconductor device | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2007-03-15 | — | — | US | disclosed |
| US-20060173050-A1 | Inhibitors of c-Jun N-terminal kinases | ABBVIE INC. | 2006-08-03 | — | — | US | disclosed |
| EP-1666970-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2006-06-07 | — | — | EP | disclosed |
| US-20050171132-A1 | Diaminopyrimidine derivatives as selective growth hormone secrectgogue receptor (GHS-R) antagonists | XIN ZHILI (US) | 2005-08-04 | — | — | US | disclosed |
| US-20050171131-A1 | Diaminopyrimidine derivatives as growth hormone secrectgogue receptor (GHS-R) antagonists | KOSOGOF CHRISTI (US) | 2005-08-04 | — | — | US | disclosed |
| WO-2005030734-A1 | DIAMINOPYRIMIDINE DERIVATIVES AS SELECTIVE GROWTH HORMONE SECRECTGOGUE RECEPTOR (GHS-R) ANTAGONISTS | ABBOTT LABORATORIES (US) | 2005-04-07 | — | — | WO | disclosed |
| US-20050070712-A1 | Pyrimidine derivatives as ghrelin receptor modulators | ABBOTT LABORATORIES | 2005-03-31 | — | — | US | disclosed |
| US-20040191672-A1 | Resist composition | MITSUBISHI GAS CHEMICAL CO., LTD. (JP) | 2004-09-30 | — | — | US | disclosed |
| EP-1443362-A2 | Resist composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-08-04 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (10 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20060173050-A1 | Inhibitors of c-Jun N-terminal kinases | MAPKAPK3, MAP3K3, MAPK3 | CTSL 3105/4885CTSB 1796/4885CTSK 859/4885 |
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | SLC39A11, CROCC, TERB1 | CTSL 1628/4885CTSB 3114/4885CTSK 2753/4885 |
| US-20230185191-A1 | COMPOUND, PRODUCTION METHOD THEREFOR, ACID GENERATOR, COMPOSITION, RESIST FILM, UNDERLAYER FILM, PATTERN FORMATION METHOD, AND OPTICAL COMPONENT | SOAT2, SOAT1, FAR1 | CTSL 3984/4885CTSB 4359/4885CTSK 3981/4885 |
| US-11256170-B2 | Compound, resist composition, and method for forming resist pattern using it | RDX, SLC11A2, FBL | CTSL 4223/4885CTSB 3142/4885CTSK 3395/4885 |
| US-20050171131-A1 | Diaminopyrimidine derivatives as growth hormone secrectgogue receptor (GHS-R) antagonists | GHSR, GIPR, GPR119 | CTSL 3582/4885CTSB 3500/4885CTSK 4349/4885 |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | C9, C5, C1R | CTSL 4078/4885CTSB 3831/4885CTSK 3678/4885 |
| US-20050171132-A1 | Diaminopyrimidine derivatives as selective growth hormone secrectgogue receptor (GHS-R) antagonists | GHSR, GIPR, GPR119 | CTSL 3585/4885CTSB 3355/4885CTSK 4251/4885 |
| US-20220144738-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD, AND METHOD FOR PURIFYING RESIN | RER1, UNC119, FEM1B | CTSL 4467/4885CTSB 3900/4885CTSK 3217/4885 |
| US-20050070712-A1 | Pyrimidine derivatives as ghrelin receptor modulators | GPR119, GIPR, GCGR | CTSL 2974/4885CTSB 2593/4885CTSK 3940/4885 |
| US-11243467-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | C9, C5, C1R | CTSL 4078/4885CTSB 3831/4885CTSK 3678/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.