Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL775914 | 0.87 | — | — | |
| SCHEMBL14865668 | 0.85 | — | — | |
| SCHEMBL524812 | 0.85 | — | — | |
| SCHEMBL28225030 | 0.82 | ALDH1A1 (0.33) | ALDH1A1 | |
| SCHEMBL75209 | 0.82 | ALDH1A1 (0.33) | ALDH1A1 | |
| SCHEMBL2776600 | 0.82 | ALDH1A1 (0.33) | ALDH1A1 | |
| SCHEMBL22811897 | 0.82 | ALDH1A1 (0.33) | ALDH1A1 | |
| SCHEMBL15721248 | 0.82 | — | — | |
| SCHEMBL27209638 | 0.81 | ALDH1A1 (0.41) | ALDH1A1 | |
| SCHEMBL10064365 | 0.81 | ALDH1A1 (0.33) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9851639-B2 | Photoacid generating polymers containing a urethane linkage for lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2017-12-26 | — | — | US | disclosed |
| US-20150340246-A1 | METHOD OF FORMING PATTERNS AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2015-11-26 | — | — | US | disclosed |
| US-8877429-B2 | Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same | JSR CORPORATION (JP) | 2014-11-04 | — | — | US | disclosed |
| US-20130260313-A1 | PHOTOACID GENERATING POLYMERS CONTAINING A URETHANE LINKAGE FOR LITHOGRAPHY | CENTRAL GLASS CO., LTD. (JP) | 2013-10-03 | — | — | US | disclosed |
| US-20110223544-A1 | RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USING THE SAME | JSR CORPORATION (JP) | 2011-09-15 | — | — | US | disclosed |
| US-20110111349-A1 | RESIN COMPOSITION FOR MAKING RESIST PATTERN INSOLUBLE, AND METHOD FOR FORMATION OF RESIST PATTERN BY USING THE SAME | JSR CORPORATION (JP) | 2011-05-12 | — | — | US | disclosed |