SCHEMBL1229565

SCHEMBL1229565

Brc1cc(I)cc(I)c1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9397842 0.96 TTR (0.33) —
SCHEMBL782213 0.92 — —
SCHEMBL29543031 0.78 — —
SCHEMBL30919779 0.78 — —
SCHEMBL221672 0.78 — —
SCHEMBL30016876 0.78 — —
SCHEMBL611653 0.78 — —
SCHEMBL7765102 0.78 — —
SCHEMBL1710893 0.78 — —
SCHEMBL1861174 0.78 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118221729-A Asymmetric organic semiconductor containing triphenylphosphine oxide unit, and preparation method and application thereof 华南理工大学 2024-06-21 — — CN claimed
EP-4703406-A1 HYDROLYZABLE SILYL GROUP-CONTAINING POLYOXYALKYLENE POLYMER, CURABLE COMPOSITION, AND CURED PRODUCT Kaneka Corporation (JP) 2026-03-04 — — EP disclosed
EP-4703367-A1 RUTHENIUM COMPLEX, METHOD FOR PRODUCING SILYL GROUP-CONTAINING COMPOUND, SILYL GROUP-CONTAINING POLYMER MIXTURE, CURABLE COMPOSITION, AND CURED PRODUCT Kaneka Corporation (JP) 2026-03-04 — — EP disclosed
US-20260049176-A1 HYDROLYZABLE SILYL GROUP-CONTAINING POLYOXYALKYLENE POLYMER, CURABLE COMPOSITION, AND CURED PRODUCT KANEKA CORPORATION (JP) 2026-02-19 — — US disclosed
US-20260049182-A1 RUTHENIUM COMPLEX, METHOD FOR PRODUCING SILYL GROUP-CONTAINING COMPOUND, SILYL GROUP-CONTAINING POLYMER MIXTURE, CURABLE COMPOSITION, AND CURED PRODUCT KANEKA CORPORATION (JP) 2026-02-19 — — US disclosed
US-20250081838-A1 ORGANIC ELECTROLUMINESCENT MATERIALS AND DEVICES UNIVERSAL DISPLAY CORPORATION (US) 2025-03-06 — — US disclosed
WO-2024225205-A1 HYDROLYZABLE SILYL GROUP-CONTAINING POLYOXYALKYLENE POLYMER, CURABLE COMPOSITION, AND CURED PRODUCT 株式会社カネカ 2024-10-31 — — WO disclosed
WO-2024225204-A1 RUTHENIUM COMPLEX, METHOD FOR PRODUCING SILYL GROUP-CONTAINING COMPOUND, SILYL GROUP-CONTAINING POLYMER MIXTURE, CURABLE COMPOSITION, AND CURED PRODUCT 株式会社カネカ 2024-10-31 — — WO disclosed
CN-118221729-A Asymmetric organic semiconductor containing triphenylphosphine oxide unit, and preparation method and application thereof 华南理工大学 2024-06-21 — — CN disclosed
US-11851604-B2 Cationic nitrogen-containing heterocycles and their application in wellbore stability SAUDI ARABIAN OIL COMPANY (SA) 2023-12-26 — — US disclosed
US-8178682-B2 Process for making organic compounds and the organic compounds made therefrom GENERAL ELECTRIC COMPANY (US) 2012-05-15 — — US disclosed
US-20110046341-A1 BRANCHED COMPOUNDS, ORGANIC THIN FILMS MADE BY USING THE SAME, AND ORGANIC FILM DEVICES OSAKA UNIVERSITY (JP) 2011-02-24 — — US disclosed
US-20100331547-A1 PROCESS FOR MAKING ORGANIC COMPOUNDS AND THE ORGANIC COMPOUNDS MADE THEREFROM GENERAL ELECTRIC COMPANY (US) 2010-12-30 — — US disclosed
US-20100331547-A1 PROCESS FOR MAKING ORGANIC COMPOUNDS AND THE ORGANIC COMPOUNDS MADE THEREFROM GENERAL ELECTRIC COMPANY (US) 2010-12-30 — — US disclosed
WO-2010151389-A1 PROCESS FOR MAKING ORGANIC COMPOUNDS AND THE ORGANIC COMPOUNDS MADE THEREFROM GENERAL ELECTRIC COMPANY (US) 2010-12-29 — — WO disclosed
EP-2251335-A1 BRANCHED COMPOUNDS, ORGANIC THIN FILMS MADE BY USING THE SAME, AND ORGANIC THIN FILM DEVICES Osaka University (JP) 2010-11-17 — — EP disclosed
US-20020028886-A1 Fluorocopolymer and process for preparing the same NIPPON MEKTRON, LTD. 2002-03-07 — — US disclosed
US-6281312-B1 USING AN ORGANOHALOGEN COMPOUND NIPPON MEKTRON, LTD. (JP) 2001-08-28 — — US disclosed
US-4920170-A Copolymer of tetrafluoroethylene and perfluoro(lower alkyk vinyl ether) NIPPON MEKTRON LIMITED (JP) 1990-04-24 — — US disclosed
US-4629815-A ALKALI METAL AMIDE OR ALKALI METAL ALCOHOLATE AND COMPLEXING AGENT RHONE-POULENC INDUSTRIES (FR) 1986-12-16 — — US disclosed
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