⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Dimethylamine SCHEMBL8134519 | 0.93 | ALDH1A1 (0.48) | — | |
| SCHEMBL11219284 | 0.83 | ALDH1A1 (0.40) | — | |
| SCHEMBL2561990 | 0.81 | — | — | |
| SCHEMBL5154397 | 0.78 | HTT (0.45) | — | |
| SCHEMBL1251275 | 0.76 | SLC9A1 (0.42) | — | |
| SCHEMBL11499475 | 0.76 | ALDH1A1 (0.33) | — | |
| SCHEMBL10413514 | 0.75 | — | — | |
| SCHEMBL11767534 | 0.75 | CNR2 (0.41) | — | |
| SCHEMBL10601434 | 0.74 | SLC9A1 (0.44) | — | |
| SCHEMBL6241128 | 0.74 | SLC9A1 (0.44) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 525 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250237947-A1 | Dry Film Resist, Photosensitive Dry Film, and Copper Clad Laminate | HANGZHOU FIRST ELECTRONIC MATERIAL CO., LTD (CN) | 2025-07-24 | — | — | US | claimed |
| CN-120138738-A | Electronic plating cobalt additive composition for hole filling and application thereof | 厦门大学 | 2025-06-13 | — | — | CN | claimed |
| CN-118871861-A | Dry film resist, photosensitive dry film and copper-clad plate | 杭州福斯特电子材料有限公司 | 2024-10-29 | — | — | CN | claimed |
| WO-2023185530-A1 | DRY FILM RESIST, PHOTOSENSITIVE DRY FILM, AND COPPER CLAD LAMINATE | 杭州福斯特电子材料有限公司 | 2023-10-05 | — | — | WO | claimed |
| US-11635688-B2 | Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates | KAYAKU ADVANCED MATERIALS, INC. (US) | 2023-04-25 | — | — | US | claimed |
| CN-115960052-A | Tetrazole compound and preparation method and application thereof | 光华科学技术研究院(广东)有限公司 | 2023-04-14 | — | — | CN | claimed |
| EP-2703062-B1 | METHOD FOR ABSORBING ACID COMPOUNDS CONTAINED IN A GASEOUS EFFLUENT BY MEANS OF AN AMINE-BASED AQUEOUS SOLUTION | IFP ENERGIES NOW (FR) | 2022-10-12 | — | — | EP | claimed |
| CN-115010770-A | Method for synthesizing RNA nucleic acid using mixed deprotection agent | 上海百力格生物技术有限公司 | 2022-09-06 | — | — | CN | claimed |
| CN-115010769-A | Method for synthesizing long-chain RNA nucleic acid by solid-phase phosphoramidite triester method | 上海百力格生物技术有限公司 | 2022-09-06 | — | — | CN | claimed |
| CN-114660895-A | Dry film resist, photosensitive dry film and copper-clad plate | 杭州福斯特电子材料有限公司 | 2022-06-24 | — | — | CN | claimed |
| US-6602655-B2 | Stability; compatibility; mixture with antifogging agent | EASTMAN KODAK COMPANY | 2003-08-05 | — | — | US | claimed |
| CN-1397837-A | DIR compound and its application in preparing photosensitive material | CHINESE LEKAI FILM GROUP CO (CN) | 2003-02-19 | — | — | CN | claimed |
| US-20020168597-A1 | Black-and-white developing compositions and methods of use | CARESTREAM HEALTH, INC. | 2002-11-14 | — | — | US | claimed |
| EP-1251396-A2 | Methods for making photothermographic emulsions and materials | EASTMAN KODAK COMPANY (US) | 2002-10-23 | — | — | EP | claimed |
| US-20020146652-A1 | For use in processing silver halide materials, and particularly radiographic materials | EASTMAN KODAK COMPANY | 2002-10-10 | — | — | US | claimed |
| US-6413710-B1 | USING ORGANONITROGEN RING COMPOUND | EASTMAN KODAK COMPANY | 2002-07-02 | — | — | US | claimed |
| EP-0522371-B1 | Photographic material and process comprising DIR coupler | EASTMAN KODAK CO (US) | 1998-08-26 | — | — | EP | claimed |
| US-5272043-A | Photographic material and process comprising DIR coupler | EASTMAN KODAK COMPANY (US) | 1993-12-21 | — | — | US | claimed |
| EP-0522371-A1 | Photographic material and process comprising dir coupler | EASTMAN KODAK COMPANY (US) | 1993-01-13 | — | — | EP | claimed |
| US-4229573-A | BACTERICIDES | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1980-10-21 | — | — | US | claimed |