SCHEMBL12354569

SCHEMBL12354569

COC(=O)O[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5712009 0.83 ALDH1A1 (0.30)
SCHEMBL10011070 0.77 DGAT1 (0.34)
SCHEMBL10012920 0.76 SMN1; SMN2 (0.32)
SCHEMBL22558082 0.75 TSHR (0.43)
SCHEMBL10009735 0.73 TSHR (0.33)
SCHEMBL10010908 0.73 SMN1; SMN2 (0.32)
SCHEMBL7761306 0.73
SCHEMBL1689367 0.73 ALDH1A1 (0.30)
SCHEMBL4748477 0.71 ALDH1A1 (0.54)
SCHEMBL4971363 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119400950-A Preparation method of lithium metal battery electrolyte based on fluorophosphate additive 哈尔滨工业大学 2025-02-07 CN claimed
CN-119400950-A Preparation method of lithium metal battery electrolyte based on fluorophosphate additive 哈尔滨工业大学 2025-02-07 CN disclosed
US-20230275269-A1 ELECTROLYTE AND ELECTROCHEMICAL APPARATUS NINGDE AMPEREX TECHNOLOGY LIMITED (CN) 2023-08-31 US disclosed
US-11735771-B2 Electrolyte solution and electrochemical device using the same NINGDE AMPEREX TECHNOLOGY LIMITED (CN) 2023-08-22 US disclosed
US-8323868-B2 Bilayer systems including a polydimethylglutarimide-based bottom layer and compositions thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-12-04 US disclosed
US-7993812-B2 Calixarene blended molecular glass photoresists and processes of use INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-08-09 US disclosed
US-20110111339-A1 BILAYER SYSTEMS INCLUDING A POLYDIMETHYLGLUTARIMIDE-BASED BOTTOM LAYER AND COMPOSITIONS THEREOF INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-05-12 US disclosed
US-20110020756-A1 Calixarene Blended Molecular Glass Photoresists and Processes of Use INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-01-27 US disclosed