SCHEMBL1235797

SCHEMBL1235797

CCCCCOCCOC(=O)C(C)(C)CO

nearest known ligand 0.48

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.48
THRB P10828 1/20 0.48
HTT P42858 1/20 0.48
KMT2A Q03164 1/20 0.48
MAPT P10636 1/20 0.48
CYP4F2 P78329 2/20 0.44
CYP4A11 Q02928 2/20 0.44
CES2 O00748 2/20 0.42
TSHR P16473 3/20 0.39
NAAA Q02083 1/20 0.39
DGKA P23743 1/20 0.39
EPHX1 P07099 1/20 0.37
USP2 O75604 1/20 0.36
PRKCA P17252 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7225680 0.89 NAAA (0.48) CYP4F2CYP4A11TSHRNAAAEPHX1
SCHEMBL1164426 0.87 NAAA (0.52) CYP4F2CYP4A11TSHRNAAADGKA
SCHEMBL20512132 0.87 NAAA (0.52) CYP4F2CYP4A11TSHRNAAADGKA
SCHEMBL10040887 0.86 MEN1 (0.48) MEN1THRBHTTKMT2AMAPT
SCHEMBL10040886 0.86 MEN1 (0.48) MEN1THRBHTTKMT2AMAPT
SCHEMBL10056796 0.86 MEN1 (0.48) MEN1THRBHTTKMT2AMAPT
SCHEMBL10349648 0.86 MEN1 (0.48) MEN1THRBHTTKMT2AMAPT
Ethylene Glycol SCHEMBL1235795 0.86 NAAA (0.46) CYP4F2CYP4A11TSHRNAAAEPHX1
SCHEMBL1164145 0.83 ALDH1A1 (0.50) CYP4F2CYP4A11TSHRNAAAEPHX1
SCHEMBL12192486 0.83 MEN1 (0.48) MEN1THRBHTTKMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021125821-A1 COMPOUND, BINDER RESIN, NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, AND DISPLAY DEVICE COMPRISING BLACK BANK FORMED USING SAME 주식회사 엘지화학 2021-06-24 WO disclosed
EP-3285942-A1 PROCESS FOR THE PREPARATION OF METALLIC NANO-PARTICLE LAYERS AND THEIR USE FOR DECORATIVE OR SECURITY ELEMENTS BASF SE (DE) 2018-02-28 EP disclosed
EP-3277884-A1 HIGH GLOSS METAL EFFECT PAPERS AND BOARDS BASF SE (DE) 2018-02-07 EP disclosed
WO-2016170160-A1 PROCESS FOR THE PREPARATION OF METALLIC NANO-PARTICLE LAYERS AND THEIR USE FOR DECORATIVE OR SECURITY ELEMENTS BASF SE (DE) 2016-10-27 WO disclosed
EP-2723576-A1 PRINTING DIFFRACTION GRATINGS ON PAPER AND BOARD BASF SE (DE) 2014-04-30 EP disclosed
WO-2012176126-A1 PRINTING DIFFRACTION GRATINGS ON PAPER AND BOARD BASF SE (DE) 2012-12-27 WO disclosed
EP-2504400-A2 COATING COMPOSITIONS FOR SECURITY ELEMENTS AND HOLOGRAMS BASF SE (DE) 2012-10-03 EP disclosed
EP-2467755-A1 APPARATUS AND METHOD FOR A SUB MICROSCOPIC AND OPTICALLY VARIABLE IMAGE CARRYING DEVICE BASF SE (DE) 2012-06-27 EP disclosed
WO-2011064162-A2 COATING COMPOSITIONS FOR SECURITY ELEMENTS AND HOLOGRAMS BASF SE (DE) 2011-06-03 WO disclosed
WO-2011020727-A1 APPARATUS AND METHOD FOR A SUB MICROSCOPIC AND OPTICALLY VARIABLE IMAGE CARRYING DEVICE BASF SE (DE) 2011-02-24 WO disclosed
EP-0891383-A1 MODIFIED POLYESTER RESIN/ORGANIC PEROXIDE SYSTEMS FOR POWDER COATINGS WHICH ARE APPLICABLE TO TEMPERATURE SENSITIVE AND METALLIC SUBSTRATES E.I. DU PONT DE NEMOURS AND COMPANY (US) 1999-01-20 EP disclosed
WO-1997038034-A1 MODIFIED POLYESTER RESIN/ORGANIC PEROXIDE SYSTEMS FOR POWDER COATINGS WHICH ARE APPLICABLE TO TEMPERATURE SENSITIVE AND METALLIC SUBSTRATES Herberts Gesellschaft mit beschränkter Haftung (DE) 1997-10-16 WO disclosed
US-4476261-A ELECTROPHORETIC DEPOSITION OF ALKYD RESIN, BLOCKED ISOCYANATED AND EPOXY COMPOUND; PAINTS; LACQUERS; VARNISHES HERBERTS GESELLSCHAFT MIT BESCHRAENKTER HAFTUNG (DE) 1984-10-09 US disclosed