SCHEMBL12376710

SCHEMBL12376710

C=C(C)C(=O)Oc1c(C(=O)Oc2ccc([S+](c3ccccc3)c3ccccc3)cc2)ccc2ccccc12

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.43
MAPT P10636 6/20 0.37
TDP1 Q9NUW8 2/20 0.37
KDM4E B2RXH2 1/20 0.37
HPGD P15428 2/20 0.36
CYP1A1 P04798 1/20 0.36
CYP1B1 Q16678 1/20 0.36
TP53 P04637 3/20 0.35
THRB P10828 1/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
NR4A2 P43354 1/20 0.34
HDAC3 O15379 1/20 0.34
HDAC4 P56524 1/20 0.34
HDAC1 Q13547 1/20 0.34
HDAC7 Q8WUI4 1/20 0.34
HDAC2 Q92769 1/20 0.34
HDAC10 Q969S8 1/20 0.34
HDAC11 Q96DB2 1/20 0.34
HDAC8 Q9BY41 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12376725 0.81 ELANE (0.47) ELANEMAPTTDP1KDM4EHPGD
SCHEMBL11982347 0.80 WDR5 (0.50) ELANETDP1KDM4EHPGDCYP1A1
SCHEMBL12376705 0.79 ELANE (0.50) ELANEMAPTTDP1KDM4EHPGD
SCHEMBL13588230 0.79 HPGD (0.42) ELANEMAPTKDM4EHPGDCYP1A1
SCHEMBL92378 0.78 ELANE (0.66) ELANEMAPTTDP1KMT2APOLB
SCHEMBL12376716 0.76 ELANE (0.64) ELANEMAPTTDP1KDM4EHPGD
SCHEMBL12376709 0.75 ELANE (0.56) ELANEMAPTTDP1KDM4EMEN1
SCHEMBL24806042 0.73 CYP1A1 (0.57) MAPTTDP1KDM4EHPGDCYP1A1
SCHEMBL8723116 0.73 NCEH1 (0.46) ELANEMAPTHSD17B10ALDH1A1
SCHEMBL24810746 0.73 MAPT (0.48) MAPTTDP1KDM4EHPGDCYP1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8691490-B2 Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-08 US disclosed
US-20110189607-A1 NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-08-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110189607-A1 NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS RPS4Y1, ETV6, RPS4X ELANE 288/4885MAPT 3052/4885TDP1 3710/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.