SCHEMBL12376770

SCHEMBL12376770

C=C(C)C(=O)OCC12CC3CC(C1)CC(C(=O)OCCS(=O)(=O)O)(C3)C2

nearest known ligand 0.43

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 1/20 0.43
ALDH1A1 P00352 6/20 0.35
MEN1 O00255 4/20 0.33
KMT2A Q03164 4/20 0.33
L3MBTL1 Q9Y468 3/20 0.33
RXFP1 Q9HBX9 1/20 0.32
PKM P14618 1/20 0.32
THRB P10828 1/20 0.32
LMNA P02545 1/20 0.31
ATM Q13315 1/20 0.30
ABL1 P00519 1/20 0.30
TSHR P16473 1/20 0.30
RIN1 Q13671 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12409643 0.83 NPSR1 (0.43) NPSR1ALDH1A1MEN1KMT2AL3MBTL1
SCHEMBL678600 0.82 ALDH1A1 (0.43) NPSR1ALDH1A1MEN1KMT2AL3MBTL1
SCHEMBL12376787 0.82 NPSR1 (0.36) NPSR1ALDH1A1MEN1KMT2AL3MBTL1
SCHEMBL20008913 0.80 NPSR1 (0.57) NPSR1ALDH1A1MEN1KMT2AL3MBTL1
SCHEMBL20009264 0.80 NPSR1 (0.44) NPSR1ALDH1A1MEN1KMT2AL3MBTL1
SCHEMBL16329438 0.80 NPSR1 (0.39) NPSR1ALDH1A1MEN1KMT2AL3MBTL1
SCHEMBL679973 0.80 ALDH1A1 (0.55) NPSR1ALDH1A1MEN1KMT2AL3MBTL1
SCHEMBL684276 0.79 ALDH1A1 (0.44) ALDH1A1MEN1KMT2AL3MBTL1THRB
SCHEMBL13963897 0.79 NPSR1 (0.38) NPSR1ALDH1A1MEN1KMT2AL3MBTL1
SCHEMBL6559851 0.78 NPSR1 (0.58) NPSR1ALDH1A1MEN1KMT2AL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8691490-B2 Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-08 US disclosed
US-8691490-B2 Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-08 US disclosed
US-20110189607-A1 NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-08-04 US disclosed
US-20110189607-A1 NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-08-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110189607-A1 NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS RPS4Y1, ETV6, RPS4X NPSR1 1114/4885ALDH1A1 4540/4885MEN1 4079/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.