Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CACNA1B | Q00975 | 4/20 | 0.74 |
| ▸ | TSHR | P16473 | 1/20 | 0.56 |
| ▸ | CTSB | P07858 | 1/20 | 0.56 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.53 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.53 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.53 |
| ▸ | KLF10 | Q13118 | 1/20 | 0.53 |
| ▸ | GAA | P10253 | 2/20 | 0.48 |
| ▸ | LMNA | P02545 | 1/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.47 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.47 |
| ▸ | POLB | P06746 | 1/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.46 |
| ▸ | CYP2A13 | Q16696 | 1/20 | 0.45 |
| ▸ | ACHE | P22303 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12964747 | 0.95 | CACNA1B (0.84) | CACNA1BTSHRCTSBALOX15CYP2C9 | |
| SCHEMBL13990610 | 0.91 | TSHR (0.67) | CACNA1BTSHRCTSBALOX15CYP2C9 | |
| SCHEMBL12964412 | 0.88 | CACNA1B (0.58) | CACNA1BTSHRCTSBALOX15CYP2C9 | |
| SCHEMBL31060430 | 0.85 | CACNA1B (1.00) | CACNA1BTSHRALOX15CYP2C9HSD17B10 | |
| SCHEMBL29942189 | 0.81 | CACNA1B (0.54) | CACNA1BTSHRCTSBALOX15CYP2C9 | |
| SCHEMBL10163424 | 0.80 | ALOX15 (0.65) | CACNA1BTSHRCTSBALOX15CYP2C9 | |
| SCHEMBL3976297 | 0.80 | TSHR (0.76) | CACNA1BTSHRALOX15HSD17B10GAA | |
| SCHEMBL8800403 | 0.80 | CTSB (0.62) | TSHRCTSBALOX15CYP2C9HSD17B10 | |
| SCHEMBL13990827 | 0.78 | SMN1; SMN2 (0.58) | CTSBALOX15CYP2C9HSD17B10GAA | |
| SCHEMBL17084495 | 0.77 | CYP2C9 (0.50) | CACNA1BALOX15CYP2C9HSD17B10GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1468331-B1 | POLYMERIC MATERIAL CONTAINING A LATENT ACID | BASF SE (DE) | 2012-10-03 | — | — | EP | disclosed |
| US-8003297-B2 | Polymeric material, containing a latent acid | BASF SE (DE) | 2011-08-23 | — | — | US | disclosed |
| US-8003297-B2 | Polymeric material, containing a latent acid | BASF SE (DE) | 2011-08-23 | — | — | US | disclosed |
| US-20100093950-A1 | POLYMERIC MATERIAL, CONTAINING A LATENT ACID | CIBA CORPORATION | 2010-04-15 | — | — | US | disclosed |
| US-20100093950-A1 | POLYMERIC MATERIAL, CONTAINING A LATENT ACID | CIBA CORPORATION | 2010-04-15 | — | — | US | disclosed |
| US-7655380-B2 | Polymeric material, containing a latent acid | CIBA SPECIALTY CHEMICALS CORPORATION (US) | 2010-02-02 | — | — | US | disclosed |
| US-20090155716-A1 | Polymeric material containing a latent acid, i.e. a compound which is not an acid but which can be converted to an acid by the influence of laser irradiation | HENEGHAN MICHAEL | 2009-06-18 | — | — | US | disclosed |
| EP-1407322-B1 | LASER MARKING METHOD | CIBA HOLDING INC (CH) | 2008-12-17 | — | — | EP | disclosed |
| US-7264916-B2 | Laser marking method | CIBA SPECIALTY CHEMICALS CORPORATION (US) | 2007-09-04 | — | — | US | disclosed |
| US-7264916-B2 | Laser marking method | CIBA SPECIALTY CHEMICALS CORPORATION (US) | 2007-09-04 | — | — | US | disclosed |
| US-7198884-B2 | Heat stable photocurable resin composition for dry film resist | CIBA SPECIALTY CHEMICALS CORP. (US) | 2007-04-03 | — | — | US | disclosed |
| US-7198884-B2 | Heat stable photocurable resin composition for dry film resist | CIBA SPECIALTY CHEMICALS CORP. (US) | 2007-04-03 | — | — | US | disclosed |
| US-20070054220-A1 | Polymeric material, containing a latent acid | HENEGHAN MICHAEL | 2007-03-08 | — | — | US | disclosed |
| US-20070054220-A1 | Polymeric material, containing a latent acid | HENEGHAN MICHAEL | 2007-03-08 | — | — | US | disclosed |