SCHEMBL12378534

SCHEMBL12378534

CCC(C)(C)c1ccc(C(=O)OCC2CO2)cc1

nearest known ligand 0.58

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TP53 P04637 2/20 0.42
MAPT P10636 2/20 0.42
HPGD P15428 2/20 0.42
TSHR P16473 2/20 0.42
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
ALDH1A1 P00352 2/20 0.42
CYP1A2 P05177 1/20 0.42
PPARG P37231 1/20 0.42
HIF1A Q16665 1/20 0.42
NPC1 O15118 2/20 0.39
POLB P06746 2/20 0.39
CYP2C9 P11712 1/20 0.39
RAB9A P51151 1/20 0.39
CHRNB2 P17787 2/20 0.38
CHRNA7 P36544 2/20 0.38
CHRNA4 P43681 2/20 0.38
CHRNA5 P30532 1/20 0.38
MGLL Q99685 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10390306 0.87 MEN1 (0.56) TP53MAPTHPGDTSHRMEN1
SCHEMBL3240666 0.87 MAPT (0.45) TP53MAPTHPGDTSHRMEN1
SCHEMBL38933 0.83 MGLL (0.47) TP53MEN1KMT2AALDH1A1CYP1A2
SCHEMBL22357194 0.83 MGLL (0.47) TP53MEN1KMT2AALDH1A1CYP1A2
SCHEMBL27538597 0.82 MGLL (0.46) TP53MEN1KMT2AALDH1A1CYP1A2
Water SCHEMBL28237529 0.82 MGLL (0.46) TP53MEN1KMT2AALDH1A1CYP1A2
Ether SCHEMBL3122176 0.81 CA12 (0.46) TP53HPGDMEN1KMT2AALDH1A1
SCHEMBL4955245 0.80 CA12 (0.42) TP53HPGDMEN1KMT2AALDH1A1
SCHEMBL28806469 0.79 PTPN2 (0.49) TP53MEN1KMT2AALDH1A1CYP1A2
SCHEMBL1372937 0.79 RAB9A (0.48) MAPTHPGDKMT2AALDH1A1NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8709701-B2 Resist underlayer film forming composition for lithography, containing aromatic fused ring-containing resin NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-04-29 US disclosed
US-20110207331-A1 Resist underlayer film forming composition for lithography, containing aromatic fused ring-containing resin NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2011-08-25 US disclosed
US-20100022090-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, CONTAINING AROMATIC FUSED RING-CONTAINING RESIN NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-01-28 US disclosed