Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.37 |
| ▸ | FKBP1A | P62942 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL47478 | 0.87 | LMNA (0.42) | LMNACYP2C9FKBP1A | |
| SCHEMBL12902878 | 0.82 | — | — | |
| SCHEMBL12960159 | 0.81 | CYP19A1 (0.30) | — | |
| SCHEMBL13779546 | 0.80 | CYP19A1 (0.31) | — | |
| SCHEMBL12902895 | 0.80 | — | — | |
| SCHEMBL12405679 | 0.79 | LMNA (0.38) | LMNACYP2C9 | |
| SCHEMBL11988737 | 0.79 | LMNA (0.47) | LMNACYP2C9 | |
| SCHEMBL13779544 | 0.77 | CYP19A1 (0.35) | — | |
| SCHEMBL47550 | 0.77 | CYP19A1 (0.38) | — | |
| SCHEMBL18845065 | 0.77 | LMNA (0.41) | LMNACYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8968979-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-03-03 | — | — | US | disclosed |
| US-7985528-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-07-26 | — | — | US | disclosed |
| US-20100129738-A1 | POSITIVE RESIST COMPOSITION AND PATTERING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-05-27 | — | — | US | disclosed |
| US-20100062366-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-11 | — | — | US | disclosed |
| US-20100062373-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-11 | — | — | US | disclosed |
| US-20100062374-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-11 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100062373-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | RER1, ASH2L, PHF2 | LMNA 1852/4885CYP2C9 4357/4885FKBP1A 4119/4885 |
| US-20100062374-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | RER1, ARCN1, ASH2L | LMNA 1215/4885CYP2C9 4754/4885FKBP1A 3679/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.