SCHEMBL12409683

SCHEMBL12409683

CCC(C)(C)C(=O)NCCNC(=O)C(F)(F)S(=O)(=O)O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 2/20 0.40
RIPK1 Q13546 3/20 0.39
ALDH1A1 P00352 2/20 0.38
POLB P06746 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.36
DRD2 P14416 2/20 0.35
DRD4 P21917 2/20 0.35
CA3 P07451 2/20 0.34
CA5A P35218 2/20 0.34
CA5B Q9Y2D0 2/20 0.34
CA12 O43570 1/20 0.34
CA2 P00918 1/20 0.34
CA4 P22748 1/20 0.34
CA6 P23280 1/20 0.34
CA7 P43166 1/20 0.34
CA9 Q16790 1/20 0.34
CA14 Q9ULX7 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12409698 0.93 EPHX1 (0.49) EPHX1RIPK1ALDH1A1POLBSMN1; SMN2
SCHEMBL14560929 0.85 ALDH1A1 (0.50) EPHX1ALDH1A1POLBSMN1; SMN2MEN1
SCHEMBL2754928 0.82 EPHX1 (0.48) EPHX1ALDH1A1POLBSMN1; SMN2MEN1
SCHEMBL13131210 0.82 EPHX1 (0.34) EPHX1ALDH1A1POLBSMN1; SMN2MEN1
SCHEMBL14153992 0.81 RIPK1 (0.52) EPHX1RIPK1ALDH1A1POLBSMN1; SMN2
SCHEMBL12409675 0.79 CNR2 (0.35) RIPK1CNR1
SCHEMBL12333879 0.79 EPHX1 (0.65) EPHX1ALDH1A1POLBSMN1; SMN2MEN1
SCHEMBL10218941 0.79 EPHX1 (0.59) EPHX1ALDH1A1POLBSMN1; SMN2MEN1
SCHEMBL2754931 0.77 EPHX1 (0.68) EPHX1ALDH1A1POLBSMN1; SMN2MEN1
SCHEMBL13450761 0.77 EPHX1 (0.50) EPHX1RIPK1ALDH1A1POLBSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8378016-B2 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-02-19 US disclosed
US-20110165519-A1 RESIN SUITABLE FOR AN ACID GENERATOR AND A CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION CONTAINING THE SAME ANDO NOBUO 2011-07-07 US disclosed
US-7932334-B2 Resin suitable for an acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-04-26 US disclosed
US-20070149702-A1 Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED 2007-06-28 US disclosed