SCHEMBL1241031

SCHEMBL1241031

CC(C)CCOC(=O)C(O)C(O)C(=O)OCCC(C)C

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 3/20 0.46
CA12 O43570 1/20 0.46
CA2 P00918 1/20 0.46
CA9 Q16790 1/20 0.46
CYP19A1 P11511 1/20 0.42
ALDH1A1 P00352 2/20 0.41
PKM P14618 2/20 0.41
KDM4E B2RXH2 1/20 0.41
GAA P10253 1/20 0.41
KMT2A Q03164 1/20 0.41
TDP1 Q9NUW8 2/20 0.40
MAPK1 P28482 3/20 0.40
HSD17B10 Q99714 1/20 0.40
HTT P42858 1/20 0.39
CHRNB2 P17787 3/20 0.38
CHRNA4 P43681 3/20 0.38
PPARG P37231 1/20 0.38
LMNA P02545 1/20 0.38
CHRNB4 P30926 1/20 0.38
CHRNA3 P32297 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28001738 0.91 TSHR (0.42) CA1CA12CA2CA9CYP19A1
SCHEMBL29220621 0.85 CA1 (0.46) CA1CA12CA2CA9CYP19A1
SCHEMBL28034 0.85 CA1 (0.46) CA1CA12CA2CA9CYP19A1
SCHEMBL3285954 0.82 RARB (0.39) ALDH1A1HTTLMNA
SCHEMBL5471739 0.82 RARB (0.39) ALDH1A1HTTLMNA
SCHEMBL1869451 0.82 CA1 (0.48) CA1CA12CA2CA9CYP19A1
SCHEMBL351059 0.82 CA1 (0.48) CA1CA12CA2CA9CYP19A1
Succinimide SCHEMBL27555395 0.82 MAPK1 (0.40) CA1CA12CA2CA9CYP19A1
SCHEMBL15972488 0.81 GABRP (0.43) ALDH1A1TDP1HTTCHRNB2CHRNA4
SCHEMBL28166478 0.81 CA1 (0.43) CA1CA12CA2CA9CYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117402113-A Production method of 8-hydroxyquinoline copper 苏州华道生物药业股份有限公司 2024-01-16 CN claimed
CN-104425209-B Compositions for flowable oxide deposition and methods of use thereof 弗萨姆材料美国有限责任公司 2017-09-08 CN claimed
CN-104425209-A Compositions for flowable oxide deposition and methods using same AIR PROD & CHEM 2015-03-18 CN claimed
EP-2840164-A1 Compositions and methods using same for flowable oxide deposition AIR PRODUCTS AND CHEMICALS, INC. (US) 2015-02-25 EP claimed
CN-117402113-A Production method of 8-hydroxyquinoline copper 苏州华道生物药业股份有限公司 2024-01-16 CN disclosed
CN-110637065-B Ink jet printing system 惠普发展公司,有限责任合伙企业 2022-08-09 CN disclosed
US-11279840-B2 Ink compositions HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2022-03-22 US disclosed
EP-3589706-B1 INKJET PRINTING SYSTEMS HEWLETT PACKARD DEVELOPMENT CO (US) 2021-10-20 EP disclosed
EP-3152269-B1 INK COMPOSITION HEWLETT PACKARD DEVELOPMENT CO (US) 2021-08-04 EP disclosed
US-11066566-B2 Inkjet printing systems HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2021-07-20 US disclosed
US-20210062025-A1 INKJET PRINTING SYSTEMS HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2021-03-04 US disclosed
US-20210009836-A1 INK COMPOSITIONS HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2021-01-14 US disclosed
US-20050161644-A1 carrier medium and at least one additive such as alkyl polyglycoside, alkyl alcohol, or various ethylene oxide adducts; use at an operating wavelength ranging from 140 nm to 248 nm, and a refractive index greater than water at an operating wavelength AIR PRODUCTS AND CHEMICALS, INC. 2005-07-28 US disclosed
EP-1557721-A2 Immersion lithography fluids AIR PRODUCTS AND CHEMICALS, INC. (US) 2005-07-27 EP disclosed
EP-1530232-A2 Process solutions containing surfactants used as post-chemical mechanical planarization treatment AIR PRODUCTS AND CHEMICALS, INC. (US) 2005-05-11 EP disclosed
US-20050081885-A1 Process solutions containing surfactants used as post-chemical mechanical planarization treatment VERSUM MATERIALS US, LLC 2005-04-21 US disclosed
US-20040204328-A1 Process solutions containing surfactants AZ ELECTRONIC MATERIALS S.À R.L. (LU) 2004-10-14 US disclosed
US-20040053800-A1 Process solutions containing surfactants AZ ELECTRONIC MATERIALS S.À R.L. (LU) 2004-03-18 US disclosed
EP-1389746-A2 Process solutions containing surfactants AIR PRODUCTS AND CHEMICALS, INC. (US) 2004-02-18 EP disclosed
US-20040029396-A1 Process solutions containing surfactants VERSUM MATERIALS US, LLC 2004-02-12 US disclosed