Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 3/20 | 0.46 |
| ▸ | CA12 | O43570 | 1/20 | 0.46 |
| ▸ | CA2 | P00918 | 1/20 | 0.46 |
| ▸ | CA9 | Q16790 | 1/20 | 0.46 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | PKM | P14618 | 2/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | GAA | P10253 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.40 |
| ▸ | CHRNB2 | P17787 | 3/20 | 0.38 |
| ▸ | CHRNA4 | P43681 | 3/20 | 0.38 |
| ▸ | PPARG | P37231 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.38 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.38 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29220621 | 1.00 | CA1 (0.46) | CA1CA12CA2CA9CYP19A1 | |
| SCHEMBL1603012 | 0.86 | BLM (0.42) | CA1CA12CA2CA9CYP19A1 | |
| SCHEMBL1241031 | 0.85 | CA1 (0.46) | CA1CA12CA2CA9CYP19A1 | |
| SCHEMBL24414508 | 0.85 | CHRNB2 (0.38) | CA1CA12CA2CA9CYP19A1 | |
| SCHEMBL24414532 | 0.85 | CHRNB2 (0.38) | CA1CA12CA2CA9CYP19A1 | |
| SCHEMBL24414472 | 0.85 | CHRNB2 (0.38) | CA1CA12CA2CA9CYP19A1 | |
| SCHEMBL10632942 | 0.85 | CHRNB2 (0.38) | CA1CA12CA2CA9CYP19A1 | |
| SCHEMBL24414552 | 0.85 | CHRNB2 (0.38) | CA1CA12CA2CA9CYP19A1 | |
| SCHEMBL3015275 | 0.84 | BLM (0.41) | CA1CA12CA2CA9TDP1 | |
| SCHEMBL671359 | 0.84 | TP53 (0.42) | ALDH1A1KMT2ACHRNB2CHRNA4CHRNB4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3089 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260144726-A1 | POLYOL-FREE COSMETIC COMPOSITION COMPRISING ALPHA HYDROXY ACID ESTER | L'OREAL (FR) | 2026-05-28 | — | — | US | claimed |
| EP-4722296-A1 | POLYHYDROXYALKANOATE COMPOSITION, POLYHYDROXYALKANOATE MOLDED ARTICLE AND PREPARATION METHOD THEREFOR | Shanghai Bluepha Microbiology Technology Co., Ltd. (CN) | 2026-04-08 | — | — | EP | claimed |
| US-12585186-B2 | Photoacid generator, chemically amplified resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-24 | — | — | US | claimed |
| US-20260050214-A1 | MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-19 | — | — | US | claimed |
| US-12535733-B2 | Molecular resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-27 | — | — | US | claimed |
| US-12428301-B1 | Graphene composition | ROCKHILL ALVIN T (US) | 2025-09-30 | — | — | US | claimed |
| CN-118878823-B | Polymer A, preparation method and application thereof | 波米科技有限公司 | 2025-06-10 | — | — | CN | claimed |
| CN-119529249-A | Method for producing polylactic acid-glycolic acid copolymer, and polylactic acid-glycolic acid copolymer produced by said method | 中国石油大学(华东) | 2025-02-28 | — | — | CN | claimed |
| US-12189292-B2 | Negative resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-01-07 | — | — | US | claimed |
| CN-119081285-A | Degradable PP material and preparation method thereof | 东莞市极光生物科技有限公司 | 2024-12-06 | — | — | CN | claimed |
| US-20040152022-A1 | Resist remover composition | DONGJIN SEMICHEM CO., LTD. (KR) | 2004-08-05 | — | — | US | claimed |
| CN-1507582-A | Resist remover composition | ����ɪ��٩��ʽ���� | 2004-06-23 | — | — | CN | claimed |
| CN-1278076-A | Agent for lowering dependence of substrate | WAKO PURE CHEM IND LTD (JP) | 2000-12-27 | — | — | CN | claimed |
| EP-1059563-A1 | Agent for reducing substrate dependence of resist | Wako Pure Chemical Industries, Ltd. (JP) | 2000-12-13 | — | — | EP | claimed |
| CN-1047786-C | Polyimide varnish | MISSAN CHEMICAL IND LTD (JP) | 1999-12-29 | — | — | CN | claimed |
| WO-1999063404-A1 | POLYMER REMOVER/PHOTORESIST STRIPPER | HAQ NOOR (US) | 1999-12-09 | — | — | WO | claimed |
| EP-0659856-B1 | Polyimide varnish | NISSAN CHEMICAL IND LTD (JP) | 1997-12-03 | — | — | EP | claimed |
| US-5461099-A | Polyimide varnish | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 1995-10-24 | — | — | US | claimed |
| CN-1109083-A | Polyimide varnish | MISSAN CHEMICAL IND LTD (JP) | 1995-09-27 | — | — | CN | claimed |
| EP-0659856-A1 | Polyimide varnish | NISSAN CHEMICAL INDUSTRIES, LIMITED (JP) | 1995-06-28 | — | — | EP | claimed |