SCHEMBL12424311

SCHEMBL12424311

CCC(CC)CCCC(C)=O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 3/20 0.47
ALDH1A1 P00352 5/20 0.43
TDP1 Q9NUW8 3/20 0.42
TSHR P16473 3/20 0.42
CYP3A4 P08684 2/20 0.42
ATM Q13315 1/20 0.42
PAOX Q6QHF9 2/20 0.41
ACHE P22303 1/20 0.41
LMNA P02545 1/20 0.36
SLC15A2 Q16348 1/20 0.36
HDAC3 O15379 1/20 0.36
HDAC4 P56524 1/20 0.36
HDAC1 Q13547 1/20 0.36
HDAC7 Q8WUI4 1/20 0.36
HDAC2 Q92769 1/20 0.36
HDAC10 Q969S8 1/20 0.36
HDAC11 Q96DB2 1/20 0.36
HDAC8 Q9BY41 1/20 0.36
HDAC6 Q9UBN7 1/20 0.36
HDAC9 Q9UKV0 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20838315 0.93 TSHR (0.46) CA2ALDH1A1TDP1TSHRCYP3A4
SCHEMBL5068644 0.91 PAOX (0.48) CA2ALDH1A1TDP1TSHRCYP3A4
SCHEMBL20838316 0.89 CA2 (0.52) CA2ALDH1A1TDP1TSHRCYP3A4
SCHEMBL11577722 0.84 ALDH1A1 (0.47) CA2ALDH1A1TDP1TSHRCYP3A4
SCHEMBL6921368 0.83 CA2 (0.43) CA2ALDH1A1TDP1TSHRCYP3A4
Acetamide SCHEMBL29048846 0.83 CA2 (0.56) CA2ALDH1A1TDP1TSHRCYP3A4
SCHEMBL8895596 0.83 ALDH1A1 (0.41) CA2ALDH1A1TDP1TSHRCYP3A4
SCHEMBL11533375 0.82 CA2 (0.48) CA2ALDH1A1TDP1TSHRCYP3A4
SCHEMBL6822231 0.82 PAOX (0.45) CA2ALDH1A1TDP1TSHRCYP3A4
SCHEMBL9700954 0.81 CA2 (0.53) CA2ALDH1A1TDP1TSHRCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12222653-B2 Method for forming semiconductor structure TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2025-02-11 US disclosed
EP-3562921-B1 LUBRICATING COMPOSITION INCLUDING N-ALKYLATED DIANILINE LUBRIZOL CORP (US) 2022-04-27 EP disclosed
CN-110114448-B Lubricating composition with alkylated naphthylamines 路博润公司 2022-03-04 CN disclosed
US-11162048-B2 Lubricating composition with alkylated naphthylamine THE LUBRIZOL CORPORATION (US) 2021-11-02 US disclosed
US-20210286269-A1 METHOD FOR FORMING SEMICONDUCTOR STRUCTURE TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2021-09-16 US disclosed
US-20210286269-A1 METHOD FOR FORMING SEMICONDUCTOR STRUCTURE TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2021-09-16 US disclosed
US-11009796-B2 Method for forming semiconductor structure TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2021-05-18 US disclosed
US-10990013-B2 Method for forming semiconductor structure TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2021-04-27 US disclosed
US-10990013-B2 Method for forming semiconductor structure TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2021-04-27 US disclosed
EP-3562922-B1 LUBRICATING COMPOSITION WITH ALKYLATED NAPHTHYLAMINE LUBRIZOL CORP (US) 2021-02-03 EP disclosed
EP-3562921-A1 LUBRICATING COMPOSITION INCLUDING N-ALKYLATED DIANILINE The Lubrizol Corporation (US) 2019-11-06 EP disclosed
US-20190316056-A1 LUBRICATING COMPOSITION WITH ALKYLATED NAPHTHYLAMINE THE LUBRIZOL CORPORATION (US) 2019-10-17 US disclosed
US-20190096675-A1 METHOD FOR FORMING SEMICONDUCTOR STRUCTURE TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2019-03-28 US disclosed
US-20190096675-A1 METHOD FOR FORMING SEMICONDUCTOR STRUCTURE TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2019-03-28 US disclosed
WO-2018125569-A1 LUBRICATING COMPOSITION INCLUDING N-ALKYLATED DIANILINE THE LUBRIZOL CORPORATION (US) 2018-07-05 WO disclosed
WO-2018125567-A1 LUBRICATING COMPOSITION WITH ALKYLATED NAPHTHYLAMINE THE LUBRIZOL CORPORATION (US) 2018-07-05 WO disclosed
US-8900791-B2 Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition FUJIFILM CORPORATION (JP) 2014-12-02 US disclosed
US-8900791-B2 Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition FUJIFILM CORPORATION (JP) 2014-12-02 US disclosed
US-20110171577-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION FUJIFILM CORPORATION (JP) 2011-07-14 US disclosed
US-20110171577-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION FUJIFILM CORPORATION (JP) 2011-07-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110171577-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION ARSA, RAD51, ARID2 CA2 3119/4885ALDH1A1 2232/4885TDP1 3244/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.