SCHEMBL124555

SCHEMBL124555

CCCCOCC1(CC)COC1

nearest known ligand 0.40

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 3/20 0.38
TSHR P16473 3/20 0.35
ASGR1 P07306 1/20 0.33
ALDH1A1 P00352 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
CTSK P43235 3/20 0.32
LMNA P02545 1/20 0.32
POLB P06746 1/20 0.32
CYP3A4 P08684 1/20 0.31
HPGD P15428 1/20 0.31
ADRB2 P07550 1/20 0.30
ADRB1 P08588 1/20 0.30
ADRB3 P13945 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL214598 0.96 TSHR (0.38) SMN1; SMN2TSHRASGR1ALDH1A1TDP1
SCHEMBL5810223 0.94 ALDH1A1 (0.39) SMN1; SMN2ASGR1ALDH1A1TDP1CTSK
SCHEMBL3164645 0.92 ALDH1A1 (0.42) SMN1; SMN2ASGR1ALDH1A1TDP1
SCHEMBL2902859 0.92 ALDH1A1 (0.42) SMN1; SMN2ASGR1ALDH1A1TDP1
SCHEMBL9933808 0.92 ALDH1A1 (0.42) SMN1; SMN2ASGR1ALDH1A1TDP1
SCHEMBL14256280 0.92 ALDH1A1 (0.42) SMN1; SMN2ASGR1ALDH1A1TDP1
SCHEMBL10071379 0.92 ALDH1A1 (0.42) SMN1; SMN2ASGR1ALDH1A1TDP1
SCHEMBL2623190 0.92 ALDH1A1 (0.42) SMN1; SMN2ASGR1ALDH1A1TDP1
SCHEMBL1130616 0.92 ALDH1A1 (0.42) SMN1; SMN2ASGR1ALDH1A1TDP1
SCHEMBL14256281 0.92 ALDH1A1 (0.42) SMN1; SMN2ASGR1ALDH1A1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 432 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112143284-B Radiation-curable ink and use thereof 常州强力电子新材料股份有限公司 2022-09-27 CN claimed
CN-108314912-B UVLED photocuring composition and application thereof in floor coating 常州格林感光新材料有限公司 2021-07-02 CN claimed
CN-112143284-A Radiation-curable ink and use thereof 常州强力电子新材料股份有限公司 2020-12-29 CN claimed
CN-112011213-A Photo-curing printing ink and application thereof 常州格林感光新材料有限公司 2020-12-01 CN claimed
CN-111752097-A Self-luminous photosensitive resin composition, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 CN claimed
CN-111752098-A Self-luminous photosensitive resin composition, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 CN claimed
CN-111061125-A Photoresist and application thereof 常州强力先端电子材料有限公司 2020-04-24 CN claimed
US-6322892-B1 A) AN EPOXY GROUP-CONTAINING COMPOUND AND OPTIONALLY AN OXETANE COMPOUND; B) A MODIFIED DIMETHYLSILICONE OIL; C) A CATION-POLYMERIZATION INITIATOR WHICH FORMS A CATION BY IRRADIATION OR BY HEATING. KANSAI PAINT CO., LTD. (JP) 2001-11-27 US claimed
US-20250206970-A1 INK COMPOSITION, LIGHT-BLOCKING MEMBER AND IMAGE DISPLAY DEVICE NATOCO CO., LTD. (JP) 2025-06-26 US disclosed
EP-4303978-B1 ELECTROLYTE SOLUTION FOR LITHIUM SECONDARY BATTERY AND LITHIUM SECONDARY BATTERY INCLUDING THE SAME SK ON CO LTD (KR) 2025-01-29 EP disclosed
WO-2024257521-A1 INK COMPOSITION, CURED PRODUCT, AND IMAGE DISPLAY DEVICE ナトコ株式会社 2024-12-19 WO disclosed
CN-118974186-A Ink composition, light shielding member, and image display device 耐涂可株式会社 2024-11-15 CN disclosed
WO-2024171549-A1 LAMINATE AND LAMINATE PRODUCTION METHOD ナトコ株式会社 2024-08-22 WO disclosed
CN-118325041-A Curable composition, method for producing cured product, and cured product thereof 株式会社ADEKA 2024-07-12 CN disclosed
US-4237250-A Polyurethanes containing aryl sulfonic acid alkyl ester groups BAYER AKTIENGESELLSCHAFT (DE) 1980-12-02 US disclosed
US-4211850-A Polyhydroxy compounds containing urethane aryl sulfonic acid hydroxyalkyl ester groups BAYER AKTIENGESELLSCHAFT (DE) 1980-07-08 US disclosed
US-4201852-A Polyurethanes based on modified polyisocyanates containing sulphonic acid ester groups and process for the production thereof BAYER AKTIENGESELLSCHAFT (DE) 1980-05-06 US disclosed
US-4189562-A Polyhydroxy compounds containing urethane aryl sulfonic acid hydroxyalkyl ester groups BAYER AKTIENGESELLSCHAFT (DE) 1980-02-19 US disclosed
EP-0000722-A1 Process for the preparation of polyurethanes containing arylsulfonic acid alkyl ester groups BAYER AG (DE) 1979-02-21 EP disclosed
EP-0000723-A1 Polyhydroxy compounds containing urethane-aryl-sulfonic acid-hydroxyalkyl ester groups, process for their preparation and their use as reaction components for the preparation of polyurethane resins BAYER AG (DE) 1979-02-21 EP disclosed